Towards nanoscale electrical measurements in liquid by advanced KPFM techniques: a review

L Collins, JI Kilpatrick, SV Kalinin… - Reports on Progress in …, 2018 - iopscience.iop.org
Fundamental mechanisms of energy storage, corrosion, sensing, and multiple biological
functionalities are directly coupled to electrical processes and ionic dynamics at solid–liquid …

Electronic and mechanical properties of monocrystalline silicon doped with trace content of N or P: A first-principles study

WJ Zhang, JS Chen, S Li, YH Wu, PL Zhang, ZS Yu… - Solid State …, 2021 - Elsevier
Monocrystalline silicon is highly promising for applications as semiconductor materials in
electronic devices. However, the intrinsic brittleness of Si as well as the relatively low …

Quantitative characterization of nanometer-scale electric fields via momentum-resolved STEM

A Beyer, MS Munde, S Firoozabadi, D Heimes… - Nano …, 2021 - ACS Publications
Most of today's electronic devices, like solar cells and batteries, are based on nanometer-
scale built-in electric fields. Accordingly, characterization of fields at such small scales has …

[HTML][HTML] Scanning capacitance microscopy of GaN-based high electron mobility transistor structures: A practical guide

C Chen, S Ghosh, F Adams, MJ Kappers, DJ Wallis… - Ultramicroscopy, 2023 - Elsevier
The scanning capacitance microscope (SCM) is a powerful tool to characterise local
electrical properties in GaN-based high electron mobility transistor (HEMT) structures with …

Computational analysis of electronic structure and optical properties of monocrystalline silicon-vacancy defect system based on density functional theory

D Geng, X Guo, Y Qi, C Wang, S Gao… - Materials Today …, 2024 - Elsevier
Monocrystalline silicon is an important substrate or base material for manufacturing
integrated circuit chips, mirrors, etc. However, it is a typical hard and brittle material, which is …

Surface potential map** of biased pn junction with kelvin probe force microscopy: application to cross-section devices

A Doukkali, S Ledain, C Guasch, J Bonnet - Applied surface science, 2004 - Elsevier
Kelvin probe force microscopy (KPFM) opens up a new field of applications as advanced
technique to characterize cross-sectional electric field as well as distribution of surface …

Identifying a do** type of semiconductor nanowires by photoassisted kelvin probe force microscopy as exemplified for GaN nanowires

X Sun, X Wang, P Wang, B Sheng, M Li, J Su… - Optical Materials …, 2017 - opg.optica.org
It remains a challenge to characterize the do** type in nanowires (NWs). We report in this
paper a novel way to probe the do** type in GaN NWs by photoassisted kelvin probe force …

Analytical model and fringing-field parasitics of carrier-depletion silicon-on-insulator optical modulation diodes

H Jayatilleka, WD Sacher, JKS Poon - IEEE Photonics Journal, 2013 - ieeexplore.ieee.org
We derive an analytical model for the depletion capacitance of silicon-on-insulator (SOI)
optical modulation diodes. This model accurately describes the parasitic fringe capacitances …

Size dependence and UV irradiation tuning of the surface potential in single conical ZnO nanowires

Z Wang, Y Gu, J Qi, S Lu, P Li, P Lin, Y Zhang - Rsc Advances, 2015 - pubs.rsc.org
Investigating and tailoring surface potential changes of a system at the interfaces is of
significance in the fundamental understanding and application of semiconductor devices …

Local do** of silicon by a point-contact microwave applicator

P Livshits, V Dikhtyar, A Inberg, A Shahadi… - Microelectronic …, 2011 - Elsevier
The feasibility of local do** in silicon by an open-end coaxial applicator with a tip made of
the do** material, eg aluminum or silver, is studied in this paper. In these experiments …