A review of tunnel field-effect transistors for improved ON-state behaviour

KRN Karthik, CK Pandey - Silicon, 2023 - Springer
Tunnel Field-effect transistor (TFET) is regarded as the most promising candidate which can
possibly replace the traditional MOSFET from current IC technology. It has gained much …

Extended-source double-gate tunnel FET with improved DC and analog/RF performance

T Joshi, Y Singh, B Singh - IEEE Transactions on Electron …, 2020 - ieeexplore.ieee.org
In this article, we propose an extended-source double-gate tunnel field-effect transistor
(ESDG-TFET) to enhance the dc and analog/RF performance. The source of an ESDG-TFET …

Investigating the effects of do** gradient, trap charges, and temperature on Ge vertical TFET for low power switching and analog applications

VK Chappa, AK Yadav, A Deka, R Khosla - Materials Science and …, 2024 - Elsevier
Influence of Gaussian do** in transistor regions, do** gradient step size (σ), interface
trap charges (ITC), and temperature on DC, Analog, and Linearity performance of Ge …

RF with linearity and non-linearity parameter analysis of gate all around negative capacitance junction less FET (GAA-NC-JLFET) for different ferroelectric thickness

P Raut, U Nanda, DK Panda - Physica Scripta, 2022 - iopscience.iop.org
Abstract A novel Gate All Around Negative Capacitance Junction less FET (GAA-NC-JLFET)
is proposed in this work, where different RF/Analog, Linear, and Non-linear parameters were …

Simulation study on ferroelectric layer thickness dependence RF/Analog and linearity parameters in ferroelectric tunnel junction TFET

R Saha - Microelectronics Journal, 2021 - Elsevier
In this paper, the impact of ferroelectric layer thickness (t FE) on input drain current
characteristic is reported in ferroelectric tunnel junction (FTJ) TFET through TCAD simulator …

Design and simulation of triple metal double-gate germanium on insulator vertical tunnel field effect transistor

T Chawla, M Khosla, B Raj - Microelectronics journal, 2021 - Elsevier
In this paper, a novel Triple metal double gate germanium on insulator vertical TFET is
proposed and investigated by using SILVACO ATLAS TCAD tool. Gate metal work-function …

Impact of temperature on the reliability of UTB-DG-FE-TFETs and their RF/analog and linearity parameter dependence

G Gopal, T Varma - Journal of Electronic Materials, 2023 - Springer
This study aimed to investigate the influence of temperature on the reliability of an ultrathin-
body double-gate ferroelectric tunnel field-effect transistor (UTB-DG-FE-TFET). An in-depth …

Effect of carrier transport process on tunneling electroresistance in ferroelectric tunnel junction

RH Koo, W Shin, KK Min, D Kwon… - IEEE Electron …, 2022 - ieeexplore.ieee.org
We demonstrate the factors that determine the tunneling electroresistance (TER) of the
ferroelectric tunnel junction (FTJ) by investigating the effects of temperature () and the …

Performance assessment of dielectrically modulated negative capacitance germanium source vertical tunnel FET biosensor for detection of breast cancer cell lines

K Vanlalawmpuia, P Ghosh - AEU-International Journal of Electronics and …, 2023 - Elsevier
The paper presents a dielectrically modulated negative capacitance Germanium source
vertical tunnel FET (DM-NC-Ge-vTFET) biosensor for detection of non-tumorigenic breast …

Performance investigation and impact of trap charges on novel lateral dual gate oxide-bilateral tunnelling based field effect transistor

P Kwatra, SV Singh, K Nigam - Microelectronics Reliability, 2023 - Elsevier
Tunnel field effect transistors (TFETs) offer advantage of robustness against short channel
effects. However, reliability issues caused by interface trap charges (ITCs) generated during …