Piezoelectric, pyroelectric, and ferroelectric materials are considered unique biomedical
materials due to their dielectric crystals and asymmetric centers that allow them to directly …

Atomic layer deposition (ALD) has become the most widely used thin‐film deposition
technique in various fields due to its unique advantages, such as self‐terminating growth …

The atomic layer deposition (ALD) technique allows the synthesis of materials at the atomic
scale to be controlled. ALD has been adapted to design and prepare single-atom catalysts …

Elevated levels of carbon dioxide (CO2) in the atmosphere and the diminishing reserves of
fossil fuels have raised profound concerns regarding the resulting consequences of global …

The 2022 Roadmap is the next update in the series of Plasma Roadmaps published by
Journal of Physics D with the intent to identify important outstanding challenges in the field of …

Atomic and close-to-atomic scale manufacturing (ACSM) represents techniques for
manufacturing high-end products in various fields, including future-generation computing …

Area-selective atomic layer deposition (AS-ALD) is a bottom-up fabrication technique that
may revolutionize the semiconductor manufacturing process. Because the efficiency and …

Conspectus Atomically precise and highly selective surface reactions are required for
advancing microelectronics fabrication. Advanced atomic processing approaches make use …

Integrated circuits are presently constructed using top-down strategies composed of multiple
etching and lithographic steps. As the feature sizes of these devices approach single-digit …

Area-selective atomic layer deposition (ALD) is an approach to self-aligned, bottom-up
nanofabrication with the potential to overcome many of the challenges facing the …