Plasma-assisted atomic layer deposition: basics, opportunities, and challenges
Plasma-assisted atomic layer deposition (ALD) is an energy-enhanced method for the
synthesis of ultra-thin films with Å-level resolution in which a plasma is employed during one …
synthesis of ultra-thin films with Å-level resolution in which a plasma is employed during one …
Advances in non-equilibrium plasma kinetics: a theoretical and experimental review
Numerous applications have required the study of CO 2 plasmas since the 1960s, from CO 2
lasers to spacecraft heat shields. However, in recent years, intense research activities on the …
lasers to spacecraft heat shields. However, in recent years, intense research activities on the …
Principles of plasma discharges and materials processing
The authors have done an excellent job of clearly explaining the different nomenclature
used in plasma processing, with the meaning of the symbols and constants commonly …
used in plasma processing, with the meaning of the symbols and constants commonly …
Chemical kinetics and reactive species in atmospheric pressure helium–oxygen plasmas with humid-air impurities
In most applications helium-based plasma jets operate in an open-air environment. The
presence of humid air in the plasma jet will influence the plasma chemistry and can lead to …
presence of humid air in the plasma jet will influence the plasma chemistry and can lead to …
Global model of low-temperature atmospheric-pressure He+ H2O plasmas
A detailed global model of atmospheric-pressure He+ H 2 O plasmas is presented in this
paper. The model incorporates 46 species and 577 reactions. Based on simulation results …
paper. The model incorporates 46 species and 577 reactions. Based on simulation results …
Oxygen discharges diluted with argon: dissociation processes
We use a global (volume averaged) model to study the dissociation processes and the
presence of negative ions and metastable species in a low pressure high density O 2/Ar …
presence of negative ions and metastable species in a low pressure high density O 2/Ar …
Air plasma kinetics under the influence of sprites
A full time-dependent kinetic study is presented for the main microscopic collisional and
radiative processes underlying the optical flashes associated with an impulsive (τ= 5 µs) …
radiative processes underlying the optical flashes associated with an impulsive (τ= 5 µs) …
Main Species and Physicochemical Processes in Cold Atmospheric‐pressure He + O2 Plasmas
The main species and chemical processes in low‐temperature atmospheric‐pressure He+
O2 plasmas are identified using a comprehensive global model. The simulation results …
O2 plasmas are identified using a comprehensive global model. The simulation results …
Foundations of atomic-level plasma processing in nanoelectronics
This article discusses key elementary surface-reaction processes in state-of-the-art plasma
etching and deposition relevant to nanoelectronic device fabrication and presents a concise …
etching and deposition relevant to nanoelectronic device fabrication and presents a concise …
[HTML][HTML] The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
The inclusion of plasma in atomic layer deposition processes generally offers the benefit of
substantially reduced growth temperatures and greater flexibility in tailoring the gas-phase …
substantially reduced growth temperatures and greater flexibility in tailoring the gas-phase …