A review of techniques for ageing detection and monitoring on embedded systems

L Lanzieri, G Martino, G Fey, H Schlarb… - ACM computing …, 2024 - dl.acm.org
Embedded digital devices are progressively deployed in dependable or safety-critical
systems. These devices undergo significant hardware ageing, particularly in harsh …

Improved Stability With Atomic-Layer-Deposited Encapsulation on Atomic-Layer In2O3 Transistors by Reliability Characterization

A Charnas, M Si, Z Lin, DY Peide - IEEE Transactions on …, 2022 - ieeexplore.ieee.org
Ultrathin In2O3 and other recently explored low-thermal-budget ultrathin oxide
semiconductors have shown great promise for back-end-of-line (BEOL)-compatible logic …

A 3-D TCAD framework for NBTI—Part I: Implementation details and FinFET channel material impact

R Tiwari, N Parihar, K Thakor, HY Wong… - … on Electron Devices, 2019 - ieeexplore.ieee.org
The time kinetics of interface trap generation and passivation (ΔN IT) and its contribution (ΔV
IT) during and after negative bias temperature instability (NBTI) stress is calculated by using …

Modeling of NBTI using BAT framework: DC-AC stress-recovery kinetics, material, and process dependence

S Mahapatra, N Parihar - IEEE Transactions on Device and …, 2020 - ieeexplore.ieee.org
Threshold voltage shift (ΔVT) due to Negative Bias Temperature Instability (NBTI) in p-
MOSFETs is modeled using the BTI Analysis Tool (BAT) framework. The ΔV T time kinetics …

Modeling of NBTI kinetics in RMG Si and SiGe FinFETs, part-I: DC stress and recovery

N Parihar, RG Southwick, M Wang… - … on Electron Devices, 2018 - ieeexplore.ieee.org
An ultrafast (10-μs delay) measurement technique is used to characterize the negative bias
temperature instability-induced threshold voltage shift (ΔV T) in replacement metal gate …

Modeling of NBTS effects in p-channel power VDMOSFETs

D Danković, N Mitrović, Z Prijić… - IEEE Transactions on …, 2020 - ieeexplore.ieee.org
This paper studies negative bias temperature instability in commercial IRF9520 p-channel
power VDMOSFETs under both static and pulsed bias stress conditions in order to model …

Modeling of DC-AC NBTI stress-recovery time kinetics in P-channel planar bulk and FDSOI MOSFETs and FinFETs

N Choudhury, N Parihar, N Goel… - IEEE Journal of the …, 2020 - ieeexplore.ieee.org
The physics-based BTI Analysis Tool (BAT) is used to model the time kinetics of threshold
voltage shift (ΔV T) during and after NBTI in p-channel planar bulk and FDSOI MOSFETs …

Online NBTI-induced partially depleted (PD) SOI degradation and recovery prediction utilizing long short-term memory (LSTM)

R Bu, Z Ren, H Ge, J Chen - Microelectronics Reliability, 2023 - Elsevier
Negative bias temperature instability (NBTI) is one of the major aging effects that account for
degradation or even failure of SOI pMOSFETs. However, several modeling methods for …

Recovery investigation of NBTI-induced traps in n-MOSFET devices

B Djezzar, A Benabdelmoumene, B Zatout… - Microelectronics …, 2020 - Elsevier
Conducting negative bias temperature instability (NBTI) stress/recovery experiments on n-
type metal-oxide-semiconductor-field-effect-transistors (n-MOSFETs), we have been able to …

NBTI mitigation by optimized HKMG thermal processing in a FinFET technology

B Ye, Y Gu, H Xu, C Tang, H Zhu… - IEEE Transactions on …, 2022 - ieeexplore.ieee.org
It has become more challenging to suppress the negative bias temperature instability (NBTI)
in advanced FinFET technology which is largely originated from the dielectric/channel …