Nanofluidics enables the imaging of stretched single molecules with potential applications
for single molecule sequence map**. Lab‐on‐a‐chip devices for single cell trap** and …

Lithography followed by plasma etching is the standard method for manufacturing
microelectronics. Requirements on lateral resolution and vertical dimensions translate into …

We study the oxidation of clean suspended mono-and few-layer graphene in real time by in
situ environmental transmission electron microscopy. At an oxygen pressure below 0.1 …

Electron beam lithography (EBL) is a maskless lithography technique used in numerous
applications for fabrication of ultrahigh-resolution photolithography masks. The main …

In this paper, we report on the fabrication and characterization of voltage configurable
nanowire field-effect-transistor (NWFET) devices suitable to broaden the flexibility in circuit …

Block copolymers can be used to template large arrays of nanopatterns with periodicities
equal to the characteristic spacing of the polymer. Here we demonstrate a technique …

A multielectron beam tool from MAPPER lithography was installed in LETI premises in July
2009. It is based on low voltage lithography. In order to prepare acceptance tests, a …

Reducing the accelerating voltage used to pattern a high-resolution inorganic thin film
electron beam resist, HafSOx dramatically decreases the dose required to pattern sub-10 …

A molecular scale simulation of the pattern formation process for chemically amplified resist
in electron beam lithography based on the stochastic approach is proposed. The initial resist …

EUV resists have been developed to be able to print sub-30nm L/S features with EUV ADT
having 0.25 NA. However, a lithographic performance especially line width roughness …