Observing and measuring strain in nanostructures and devices with transmission electron microscopy

MJ Hÿtch, AM Minor - MRS bulletin, 2014 - cambridge.org
The evolution of elastic strain engineering in nanostructures and devices requires
characterization tools that can be used to not only observe but also quantify the actual strain …

[HTML][HTML] Strain map** of semiconductor specimens with nm-scale resolution in a transmission electron microscope

D Cooper, T Denneulin, N Bernier, A Béché… - Micron, 2016 - Elsevier
The last few years have seen a great deal of progress in the development of transmission
electron microscopy based techniques for strain map**. New techniques have appeared …

Strain measurement at the nanoscale: Comparison between convergent beam electron diffraction, nano-beam electron diffraction, high resolution imaging and dark …

A Béché, JL Rouvière, JP Barnes, D Cooper - Ultramicroscopy, 2013 - Elsevier
Convergent beam electron diffraction (CBED), nano-beam electron diffraction (NBED or
NBD), high resolution imaging (HRTEM and HRSTEM) and dark field electron holography …

Lattice and strain analysis of atomic resolution Z-contrast images based on template matching

JM Zuo, AB Shah, H Kim, Y Meng, W Gao, JL Rouviére - Ultramicroscopy, 2014 - Elsevier
A real space approach is developed based on template matching for quantitative lattice
analysis using atomic resolution Z-contrast images. The method, called TeMA, uses the …

Strain-induced performance enhancement of trigate and omega-gate nanowire FETs scaled down to 10-nm width

R Coquand, M Casse, S Barraud… - IEEE transactions on …, 2012 - ieeexplore.ieee.org
A detailed study of performance in uniaxially strained Si nanowire (NW) transistors
fabricated by lateral strain relaxation of biaxial strained-SOI (sSOI) substrate is presented …

[BOOK][B] Metrology and Diagnostic Techniques for Nanoelectronics

Z Ma, DG Seiler - 2017 - taylorfrancis.com
Nanoelectronics is changing the way the world communicates, and is transforming our daily
lives. Continuing Moore's law and miniaturization of low-power semiconductor chips with …

3D strain measurement of heterostructures using the scanning transmission electron microscopy moiré depth sectioning method

H Wen, H Zhang, R Peng, C Liu, S Liu, F Liu… - Small …, 2023 - Wiley Online Library
The mechanical properties of micro‐and nanoscale materials directly determine the
reliability of heterostructures, microstructures, and microdevices. Therefore, an accurate …

[BOOK][B] Principles of Electron Optics, Volume 3: Fundamental Wave Optics

PW Hawkes, E Kasper - 2022 - books.google.com
Principles of Electron Optic: Volume Three: Wave Optics, discusses this essential topic in
microscopy to help readers understand the propagation of electrons from the source to the …

Towards quantitative electrostatic potential map** of working semiconductor devices using off-axis electron holography

S Yazdi, T Kasama, M Beleggia, MS Yekta… - Ultramicroscopy, 2015 - Elsevier
Pronounced improvements in the understanding of semiconductor device performance are
expected if electrostatic potential distributions can be measured quantitatively and reliably …

Determination of stress, strain, and elemental distribution within In (Ga) As quantum dots embedded in GaAs using advanced transmission electron microscopy

N Cherkashin, S Reboh, MJ Hÿtch, A Claverie… - Applied Physics …, 2013 - pubs.aip.org
Non-truncated pyramidal In (Ga) As quantum dots (QDs) embedded in GaAs were obtained
by a combination of low temperature/high rate GaAs covering of InAs QDs. We use …