Ultra-low-threshold continuous-wave and pulsed lasing in tensile-strained GeSn alloys

A Elbaz, D Buca, N von den Driesch, K Pantzas… - Nature …, 2020‏ - nature.com
Strained GeSn alloys are promising for realizing light emitters based entirely on group IV
elements. Here, we report GeSn microdisk lasers encapsulated with a SiN x stressor layer to …

Demonstration of a Ge/GeSn/Ge quantum-well microdisk resonator on silicon: enabling high-quality Ge (Sn) materials for micro-and nanophotonics

R Chen, S Gupta, YC Huang, Y Huo, CW Rudy… - Nano …, 2014‏ - ACS Publications
We theoretically study and experimentally demonstrate a pseudomorphic Ge/Ge0. 92Sn0.
08/Ge quantum-well microdisk resonator on Ge/Si (001) as a route toward a compact GeSn …

Raman spectral shift versus strain and composition in GeSn layers with 6%–15% Sn content

A Gassenq, L Milord, J Aubin, N Pauc, K Guilloy… - Applied Physics …, 2017‏ - pubs.aip.org
GeSn alloys are the subject of intense research activities as these group IV semiconductors
present direct bandgap behaviors for high Sn contents. Today, the control of strain becomes …

Highly Selective Dry Etching of Germanium over Germanium–Tin (Ge1–xSnx): A Novel Route for Ge1–xSnx Nanostructure Fabrication

S Gupta, R Chen, YC Huang, Y Kim, E Sanchez… - Nano …, 2013‏ - ACS Publications
We present a new etch chemistry that enables highly selective dry etching of germanium
over its alloy with tin (Ge1–x Sn x). We address the challenges in synthesis of high-quality …

Temperature dependent spectral response and detectivity of GeSn photoconductors on silicon for short wave infrared detection

BR Conley, A Mosleh, SA Ghetmiri, W Du, RA Soref… - Optics express, 2014‏ - opg.optica.org
The GeSn direct gap material system, with Si complementary-metal-oxide semiconductor
(CMOS) compatibility, presents a promising solution for direct incorporation of focal plane …

Nanocrystalline Group IV Alloy Semiconductors: Synthesis and Characterization of Ge1–xSnx Quantum Dots for Tunable Bandgaps

RJA Esteves, MQ Ho, IU Arachchige - Chemistry of Materials, 2015‏ - ACS Publications
Ge1–x Sn x alloys are among a small class of benign semiconductors with composition
tunable bandgaps in the near-infrared (NIR) spectrum. As the amount of Sn is increased, the …

Material Characterization of Ge1−x Sn x Alloys Grown by a Commercial CVD System for Optoelectronic Device Applications

A Mosleh, SA Ghetmiri, BR Conley… - Journal of electronic …, 2014‏ - Springer
High-quality compressive-strained Ge 1− x Sn x/Ge films have been deposited on Si (001)
substrate using a mainstream commercial chemical vapor deposition reactor. The growth …

Effective strain relaxation of GeSn single crystal with Sn content of 16.5% on Ge grown by high-temperature sputtering

G Lin, K Qian, H Ding, J Qian, J Xu, J Wang, S Ke… - Applied Surface …, 2023‏ - Elsevier
In this work, epitaxy of GeSn with high-Sn content of 16.5% on Ge substrate by sputtering at
a relative high temperature of 259° C is reported. The strain relaxation in constant-Sn …

Colloidal tin–germanium nanorods and their Li-ion storage properties

MI Bodnarchuk, KV Kravchyk, F Krumeich, S Wang… - ACS …, 2014‏ - ACS Publications
We report a facile colloidal synthesis of tin–germanium (Sn–Ge) heterostructures in the form
of nanorods with a small aspect ratio of 1.5–3 and a length smaller than 50 nm. In the two …

Epitaxial growth of Ge1-xSnx on c–Plane sapphire substrate by molecular beam epitaxy

D Gayakwad, D Singh, R Kumar, YI Mazur, SQ Yu… - Journal of Crystal …, 2023‏ - Elsevier
In this paper, we have demonstrated the first epitaxial growth of Ge 1-x Sn x on c–plane
Sapphire. This has been achieved by growing Ge 1-x Sn x on Ge (1 1 1)/AlAs/Al 2 O 3 (0 0 0 …