Electrically tunable multicolored filter using birefringent plasmonic resonators and liquid crystals
Dynamic tuning of color filters finds numerous applications including displays or image
sensors. Plasmonic resonators are subwavelength nanostructures which can tailor the …
sensors. Plasmonic resonators are subwavelength nanostructures which can tailor the …
Carbon nanostructures for actuators: an overview of recent developments
In recent decades, micro and nanoscale technologies have become cutting-edge frontiers in
material science and device developments. This worldwide trend has induced further …
material science and device developments. This worldwide trend has induced further …
Resistless EUV lithography: Photon-induced oxide patterning on silicon
In this work, we show the feasibility of extreme ultraviolet (EUV) patterning on an HF-treated
silicon (100) surface in the absence of a photoresist. EUV lithography is the leading …
silicon (100) surface in the absence of a photoresist. EUV lithography is the leading …
High-efficiency diffraction gratings for EUV and soft x-rays using spin-on-carbon underlayers
We report on the fabrication and characterization of high-resolution gratings with high
efficiency in the extreme ultraviolet (EUV) and soft x-ray ranges using spin-on-carbon (SOC) …
efficiency in the extreme ultraviolet (EUV) and soft x-ray ranges using spin-on-carbon (SOC) …
Standard wafer with programed defects to evaluate the pattern inspection tools for 300-mm wafer fabrication for 7-nm node and beyond
S Iida, T Nagai, T Uchiyama - Journal of Micro …, 2019 - spiedigitallibrary.org
Background: Standard patterned sample with programed defects (PDs) is effective to
evaluate the tool performance of pattern inspection system, but the fabrication of such …
evaluate the tool performance of pattern inspection system, but the fabrication of such …
Achromatic Talbot lithography with nano-ring masks for high-throughput periodic patterning
Periodic patterning is important for various scientific and technological applications,
especially in the nanoscale. Achromatic Talbot lithography (ATL) utilizing extreme ultraviolet …
especially in the nanoscale. Achromatic Talbot lithography (ATL) utilizing extreme ultraviolet …
Controllable Fabrication of Silicon Nanopore Arrays by Two-Step Inductively Coupled Plasma Etching Using Self-Assembled Anodic Aluminum Oxide Mask
J Tian, X Meng, Y Liu, J Cui, M Li, K Fan… - ECS Journal of Solid …, 2023 - iopscience.iop.org
Silicon nanopore arrays (SiNPs) were prepared by a two-step inductively coupled plasma
(ICP) etching process using a self-assembled anodic aluminum oxide film mask. The …
(ICP) etching process using a self-assembled anodic aluminum oxide film mask. The …
Highly substituted fullerene-based spin-on organic hardmasks
AG Brown, G Dawson, G O'Callaghan… - Advances in …, 2020 - spiedigitallibrary.org
Irresistible Materials has previously introduced the HM340 series of fullerene based spin-on
carbon hardmasks, and reported on material characterization, including very high carbon …
carbon hardmasks, and reported on material characterization, including very high carbon …
Ultra-high carbon fullerene-based spin-on-carbon hardmasks
AG Brown, G Dawson, E Jackson… - … and Processes XL, 2023 - spiedigitallibrary.org
Fullerene-based spin-on-carbon enables very high carbon content, and shows very high
thermal stability, and etch resistance approaching amorphous carbon. Here we describe the …
thermal stability, and etch resistance approaching amorphous carbon. Here we describe the …