Sum-frequency generation spectroscopy of interfaces

F Vidal, A Tadjeddine - Reports on Progress in Physics, 2005 - iopscience.iop.org
This paper reviews aspects of nonlinear optical spectroscopy of interfaces. The emphasis is
put on second-order nonlinear optical techniques, such as sum-frequency generation (SFG) …

[КНИГА][B] Semiconductor surfaces and interfaces

W Mönch - 2013 - books.google.com
Semiconductor Surfaces and Interfaces deals with structural and electronic properties of
semiconductor surfaces and interfaces. The first part introduces the general aspects of …

OH ions in Oxide Crystals

M Wöhlecke, L Kovács - Critical Reviews in Solid State and …, 2001 - Taylor & Francis
This article reviews the spectroscopic properties of hydrogen bound to a large variety of
synthetic compounds like simple oxides, perovskites, the LiNbO3 family, KTP, sillenites …

Comparison of Si(111) surfaces prepared using aqueous solutions of NH4F versus HF

GS Higashi, RS Becker, YJ Chabal… - Applied physics …, 1991 - ui.adsabs.harvard.edu
Vacuum scanning tunneling microscopy has been used to investigate the hydrogen-
terminated Si (111) surfaces obtained upon dissolution of the native oxide in HF and NH 4 F …

[КНИГА][B] Electronic properties of semiconductor interfaces

W Mönch - 2013 - books.google.com
Almost all semiconductor devices contain metal-semiconductor, insulator-semiconductor,
insulator-metal and/or semiconductor-semiconductor interfaces; and their electronic …

Atomic-scale conversion of clean Si (111): H-1× 1 to Si (111)-2× 1 by electron-stimulated desorption

RS Becker, GS Higashi, YJ Chabal, AJ Becker - Physical review letters, 1990 - APS
Tunneling images of the ideal Si (111): H-1× 1 surface exhibit features and electronic
structure consistent with a simple termination of the surface dangling bonds by atomic …

Chemical etching of vicinal Si(111): Dependence of the surface structure and the hydrogen termination on the pH of the etching solutions

P Jakob, YJ Chabal - The Journal of Chemical Physics, 1991 - pubs.aip.org
Infrared spectroscopy is used to study the etching process of stepped Si (111) 9° surfaces as
a function of the p H of the etching HF solutions. This process results in complete H …

Morphology of hydrogen-terminated Si (111) and Si (100) surfaces upon etching in HF and buffered-HF solutions

P Dumas, YJ Chabal, P Jakob - Surface Science, 1992 - Elsevier
High resolution electron energy loss spectroscopy (EELS) and infrared absorption
spectroscopy (IRAS) are used to characterize Si (111) and Si (100) surfaces after chemical …

Identification of strained silicon layers at Si- interfaces and clean Si surfaces by nonlinear optical spectroscopy

W Daum, HJ Krause, U Reichel, H Ibach - Physical review letters, 1993 - APS
Optical second-harmonic and sum-frequency spectra of clean and oxidized Si (100) and Si
(111) samples reveal a strong resonance band at 3.3 eV photon energy. It is concluded that …

A non-oxidative approach toward chemically and electrochemically functionalizing Si (111)

RD Rohde, HD Agnew, WS Yeo… - Journal of the …, 2006 - ACS Publications
A general method for the non-oxidative functionalization of single-crystal silicon (111)
surfaces is described. The silicon surface is fully acetylenylated using two-step …