Revival of ferroelectric memories based on emerging fluorite‐structured ferroelectrics

JY Park, DH Choe, DH Lee, GT Yu, K Yang… - Advanced …, 2023 - Wiley Online Library
Over the last few decades, the research on ferroelectric memories has been limited due to
their dimensional scalability and incompatibility with complementary metal‐oxide …

HfO2-based ferroelectrics: From enhancing performance, material design, to applications

H Chen, X Zhou, L Tang, Y Chen, H Luo… - Applied Physics …, 2022 - pubs.aip.org
Nonvolatile memories are in strong demand due to the desire for miniaturization, high-speed
storage, and low energy consumption to fulfill the rapid developments of big data, the …

Ultrathin ferroic HfO2–ZrO2 superlattice gate stack for advanced transistors

SS Cheema, N Shanker, LC Wang, CH Hsu, SL Hsu… - Nature, 2022 - nature.com
With the scaling of lateral dimensions in advanced transistors, an increased gate
capacitance is desirable both to retain the control of the gate electrode over the channel and …

Emergent ferroelectricity in subnanometer binary oxide films on silicon

SS Cheema, N Shanker, SL Hsu, Y Rho, CH Hsu… - Science, 2022 - science.org
The critical size limit of voltage-switchable electric dipoles has extensive implications for
energy-efficient electronics, underlying the importance of ferroelectric order stabilized at …

Enhanced ferroelectricity in ultrathin films grown directly on silicon

SS Cheema, D Kwon, N Shanker, R Dos Reis, SL Hsu… - Nature, 2020 - nature.com
Ultrathin ferroelectric materials could potentially enable low-power logic and nonvolatile
memories,. As ferroelectric materials are made thinner, however, the ferroelectricity is …

Intrinsic ferroelectricity in Y-doped HfO2 thin films

Y Yun, P Buragohain, M Li, Z Ahmadi, Y Zhang, X Li… - Nature Materials, 2022 - nature.com
Ferroelectric HfO2-based materials hold great potential for the widespread integration of
ferroelectricity into modern electronics due to their compatibility with existing Si technology …

Roadmap on ferroelectric hafnia-and zirconia-based materials and devices

JPB Silva, R Alcala, UE Avci, N Barrett, L Bégon-Lours… - APL Materials, 2023 - pubs.aip.org
Ferroelectric hafnium and zirconium oxides have undergone rapid scientific development
over the last decade, pushing them to the forefront of ultralow-power electronic systems …

Progress and future prospects of negative capacitance electronics: A materials perspective

M Hoffmann, S Slesazeck, T Mikolajick - APL Materials, 2021 - pubs.aip.org
Negative capacitance in ferroelectric materials has been suggested as a solution to reduce
the power dissipation of electronics beyond fundamental limits. The discovery of …

Review of defect chemistry in fluorite-structure ferroelectrics for future electronic devices

MH Park, DH Lee, K Yang, JY Park, GT Yu… - Journal of Materials …, 2020 - pubs.rsc.org
Ferroelectricity in fluorite-structure oxides, such as (doped) HfO2 and ZrO2, and their solid
solution, nanolaminates, and superlattices has attracted increasing interest for future …

Epitaxial Ferroelectric HfO2 Films: Growth, Properties, and Devices

I Fina, F Sanchez - ACS Applied Electronic Materials, 2021 - ACS Publications
About ten years after ferroelectricity was first reported in doped HfO2 polycrystalline films,
there is tremendous interest in this material and ferroelectric oxides are once again in the …