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[HTML][HTML] Atomic layer deposition and other thin film deposition techniques: from principles to film properties
Thin film is a modern technology aimed at improving the structural, electrical, magnetic,
optical, and mechanical properties of bulk materials. This technology has so far found …
optical, and mechanical properties of bulk materials. This technology has so far found …
New development of atomic layer deposition: processes, methods and applications
Atomic layer deposition (ALD) is an ultra-thin film deposition technique that has found many
applications owing to its distinct abilities. They include uniform deposition of conformal films …
applications owing to its distinct abilities. They include uniform deposition of conformal films …
Atomic layer deposition thin film techniques and its bibliometric perspective
Atomic layer deposition (ALD) is known for depositing ultra-thin film materials that enable
control of composition, highly conformal film, desirable thickness, self-saturating, and …
control of composition, highly conformal film, desirable thickness, self-saturating, and …
[ספר][B] Optoelectronics and Spintronics in Smart Thin Films
Smart thin films, composed of functional materials deposited in thin layers, have opened
new avenues for the development of flexible, lightweight, and high-performance devices …
new avenues for the development of flexible, lightweight, and high-performance devices …
Introduction to ALD Technologies
Concerns about depletion of resources, climate change, and pollution drive the increasing
importance of sustainable processes. Atomic layer deposition (ALD) is a highly versatile …
importance of sustainable processes. Atomic layer deposition (ALD) is a highly versatile …
Surface passivation of Ge by atomic layer deposited SiO2
O Leiviskä - 2024 - aaltodoc.aalto.fi
Germanium (Ge) is seen as a promising material for applications where high carrier mobility
or absorption of NIR photons is needed. However, the lack of reliable surface passivation …
or absorption of NIR photons is needed. However, the lack of reliable surface passivation …
Atomic layer deposition in fabrication of micro-and nanodevices
V Rontu - 2020 - aaltodoc.aalto.fi
Atomic layer deposition (ALD) has become a widely used thin film deposition method in
fabrication of many micro-and nanodevices. In this thesis, the reasons for this are …
fabrication of many micro-and nanodevices. In this thesis, the reasons for this are …
Develo** a Nanoporous MoS2 Membrane Using Atomic Layer Deposition for Water Desalination
OP Ozaveshe - 2021 - search.proquest.com
Climate change and its resulting consequences, such as changes in the natural system
contributing to glacier melting, sea-level rise and evaporation, are among the challenges …
contributing to glacier melting, sea-level rise and evaporation, are among the challenges …
Viabilidade e desenvolvimento de células solares de banda intermediária baseadas em GaAs com pontos quânticos de submonocamada de InAs/GaAs
TB Santos - 2023 - teses.usp.br
O objetivo deste trabalho é avaliar a viabilidade de células solares de banda intermediária
baseadas em GaAs e crescidas por epitaxia por feixe molecular utilizando pontos quânticos …
baseadas em GaAs e crescidas por epitaxia por feixe molecular utilizando pontos quânticos …
Atomic Layer Deposition
Atomic layer deposition (ALD) is a procedure for depositing diverse thin-layer substances
from the vapor stage. ALD holds significant potential to explore electronics and conversion …
from the vapor stage. ALD holds significant potential to explore electronics and conversion …