Si-compatible candidates for high- dielectrics with the perovskite structure

S Coh, T Heeg, JH Haeni, MD Biegalski, J Lettieri… - Physical Review B …, 2010 - APS
We analyze both experimentally (where possible) and theoretically from first principles the
dielectric tensor components and crystal structure of five classes of P bnm perovskites. All of …

Thermal stability of dysprosium scandate thin films

C Adelmann, S Van Elshocht, A Franquet… - Applied Physics …, 2008 - pubs.aip.org
The thermal stability of Dy Sc O 3 thin films in contact with Si O 2 or Hf O 2 during annealing
up to 1000 C has been studied. It is found that Dy Sc O 3∕ Si O 2 stacks react during …

Effects of annealing on the electrical and interfacial properties of amorphous lanthanum scandate high-κ films prepared by molecular beam deposition

JMJ Lopes, U Littmark, M Roeckerath, S Lenk… - Journal of applied …, 2007 - pubs.aip.org
Amorphous LaScO 3 thin films were grown on (100) Si by molecular beam deposition and
the effects of postdeposition thermal treatments on the film properties were studied after …

Incipient amorphous-to-crystalline transition in HfO2 as a function of thickness scaling and anneal temperature

PS Lysaght, JC Woicik, MA Sahiner, BH Lee… - Journal of non …, 2008 - Elsevier
A series of 1.4, 1.8, and 4.0 nm thick HfO2 films deposited on Si (100) substrates have been
measured by extended X-ray absorption fine-structure prior to anneal processing, following …

Semiconductor devices and methods of manufacture thereof

S Govindarajan - US Patent 7,564,114, 2009 - Google Patents
Semiconductor devices and methods of manufacture thereof are disclosed. A preferred
embodiment comprises a method of forming an insulating material layer. The method …

Semiconductor devices and methods of manufacture thereof

S Govindarajan - US Patent 7,611,972, 2009 - Google Patents
Semiconductor devices and methods of manufacture thereof are disclosed. A preferred
embodiment comprises a method of forming an insulating material layer. The method …

Stability of terbium scandate on Si (100)

M Copel, N Bojarczuk, LF Edge, S Guha - Applied Physics Letters, 2010 - pubs.aip.org
We have examined the stability of TbScO 3 on Si (100) using medium energy ion scattering.
At high temperatures the dielectric decomposes into a Tb-rich silicate layer near the …

[BOK][B] Electronic structure theory: applications and geometrical aspects

S Coh - 2011 - search.proquest.com
This thesis contains several applications of the first-principles electronic-structure theory with
special emphasis in parts of the thesis on the geometrical aspects of the theory. We start by …

Structural and electrical properties of terbium scandate films deposited by atomic layer deposition and high temperature annealing effects

E Cianci, A Lamperti, G Congedo… - ECS Journal of Solid …, 2012 - iopscience.iop.org
In this work terbium scandate thin films have been deposited by atomic layer deposition
(ALD) on SiO 2/Si and Si 3 N 4/SiO 2/Si stacks and their structural and electrical behavior as …

Electron tunneling spectroscopy study of amorphous films of the gate dielectric candidates LaAlO3 and LaScO3

M Wang, W He, TP Ma, LF Edge, DG Schlom - Applied physics letters, 2007 - pubs.aip.org
Electron tunneling spectroscopy (ETS) was used to study amorphous La Al O 3 and La Sc O
3 thin film gate dielectrics for silicon metal-oxide-semiconductor structure. These gate …