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Border traps in Ge/III–V channel devices: Analysis and reliability aspects
The aim of this review paper is to describe the impact of so-called border traps (BTs) in high-
k gate oxides on the operation and reliability of high-mobility channel transistors. First, a …
k gate oxides on the operation and reliability of high-mobility channel transistors. First, a …
Total-Ionizing-Dose Effects, Border Traps, and 1/f Noise in Emerging MOS Technologies
DM Fleetwood - IEEE Transactions on Nuclear Science, 2020 - ieeexplore.ieee.org
Subthreshold leakage currents and threshold-voltage shifts due to total-ionizing-dose (TID)
irradiation are reviewed briefly for highly scaled devices in emerging MOS technologies …
irradiation are reviewed briefly for highly scaled devices in emerging MOS technologies …
Junctionless versus inversion-mode lateral semiconductor nanowire transistors
This paper reports on gate-all-around silicon nanowire field-effect transistors (FETs) built in
a lateral configuration, which represent the ultimate scaling limit of triple-gate finFET devices …
a lateral configuration, which represent the ultimate scaling limit of triple-gate finFET devices …
Hardware implementation of a true random number generator integrating a hexagonal boron nitride memristor with a commercial microcontroller
The development of the internet-of-things requires cheap, light, small and reliable true
random number generator (TRNG) circuits to encrypt the data—generated by objects or …
random number generator (TRNG) circuits to encrypt the data—generated by objects or …
High‐temporal‐resolution characterization reveals outstanding random telegraph noise and the origin of dielectric breakdown in h‐BN memristors
Memristor‐based electronic memory have recently started commercialization, although its
market size is small (~ 0.5%). Multiple studies claim their potential for hardware …
market size is small (~ 0.5%). Multiple studies claim their potential for hardware …
Towards interdependencies of aging mechanisms
With technology in deep nano scale, the susceptibility of transistors to various aging
mechanisms such as Negative/Positive Bias Temperature Instability (NBTI/PBTI) and Hot …
mechanisms such as Negative/Positive Bias Temperature Instability (NBTI/PBTI) and Hot …
Boost up the electrical performance of InGaZnO thin film transistors by inserting an ultrathin InGaZnO: H layer
A Abliz, J Wang, L Xu, D Wan, L Liao, C Ye… - Applied Physics …, 2016 - pubs.aip.org
This study examined the electrical performance of bilayer channel InGaZnO: H/InGaZnO thin-
film transistors (TFTs). The field-effect mobility and bias stress stability of the InGaZnO device …
film transistors (TFTs). The field-effect mobility and bias stress stability of the InGaZnO device …
Nanoscale map** of carrier mobilities in the ballistic transports of carbon nanotube networks
J Kim, Y Oh, J Shin, M Yang, N Shin, S Shekhar… - ACS …, 2022 - ACS Publications
Much progress has been made in the nanoscale analysis of nanostructures, while the
map** of key charge transport properties such as a carrier mobility remains a challenge …
map** of key charge transport properties such as a carrier mobility remains a challenge …
[KNIHA][B] Random telegraph signals in semiconductor devices
E Simoen, C Claeys - 2016 - iopscience.iop.org
Following their first observation in 1984, random telegraph signals (RTSs) were initially a
purely scientific tool to study fundamental aspects of defects in semiconductor devices. As …
purely scientific tool to study fundamental aspects of defects in semiconductor devices. As …
High uniformity normally-OFF p-GaN gate HEMT using self-terminated digital etching technique
HC Chiu, YS Chang, BH Li, HC Wang… - … on Electron Devices, 2018 - ieeexplore.ieee.org
A normally-OFF p-GaN gate AlGaN/GaN high-electron-mobility transistor with high on-state
resistance (RON) uniformity was realized using a self-terminated digital etching technique …
resistance (RON) uniformity was realized using a self-terminated digital etching technique …