GaN-based power devices: Physics, reliability, and perspectives

M Meneghini, C De Santi, I Abid, M Buffolo… - Journal of Applied …, 2021 - pubs.aip.org
Over the last decade, gallium nitride (GaN) has emerged as an excellent material for the
fabrication of power devices. Among the semiconductors for which power devices are …

[HTML][HTML] Trap** phenomena and degradation mechanisms in GaN-based power HEMTs

M Meneghini, A Tajalli, P Moens, A Banerjee… - Materials Science in …, 2018 - Elsevier
This paper reports an overview of the most relevant trap** and degradation mechanisms
that limit the performance and lifetime of GaN-based transistors for application in power …

Vertical GaN MOSFET power devices

C Langpoklakpam, AC Liu, YK Hsiao, CH Lin, HC Kuo - Micromachines, 2023 - mdpi.com
Gallium nitride (GaN) possesses remarkable characteristics such as a wide bandgap, high
critical electric field, robust antiradiation properties, and a high saturation velocity for high …

Investigation of the p-GaN gate breakdown in forward-biased GaN-based power HEMTs

AN Tallarico, S Stoffels, P Magnone… - IEEE Electron …, 2016 - ieeexplore.ieee.org
In this letter, we report a detailed experimental investigation of the time-dependent
breakdown induced by forward gate stress in GaN-based power HEMTs with a p-type gate …

Fluorine-implanted termination for vertical GaN Schottky rectifier with high blocking voltage and low forward voltage drop

S Han, S Yang, K Sheng - IEEE Electron Device Letters, 2019 - ieeexplore.ieee.org
In this letter, fluorine-implanted termination (FIT) has been demonstrated in vertical GaN-on-
GaN Schottky barrier diodes (SBDs). Owing to the unique feature of F ions that can become …

Beveled Fluoride Plasma Treatment for Vertical -Ga2O3 Schottky Barrier Diode With High Reverse Blocking Voltage and Low Turn-On Voltage

Z Hu, Y Lv, C Zhao, Q Feng, Z Feng… - IEEE Electron …, 2020 - ieeexplore.ieee.org
In this letter, we report on demonstrating a high performance vertical β-Ga 2 O 3 Schottky
barrier diode (SBD) based on a self-aligned beveled fluorine plasma treatment (BFPT) edge …

Characterization and modeling of 2DEG mobility in AlGaN/AlN/GaN MIS-HEMT

I Nifa, C Leroux, A Torres, M Charles… - Microelectronic …, 2019 - Elsevier
We present a detailed study of the process influence on two-dimensional electron gas
(2DEG) transport properties in Al 0.25 Ga 0.75 N/AlN/GaN heterostructure. Hall effect …

Time-dependent threshold voltage instability mechanisms of p-GaN gate AlGaN/GaN HEMTs under high reverse bias conditions

S Li, Z He, R Gao, Y Chen, Y Chen… - … on Electron Devices, 2020 - ieeexplore.ieee.org
In this article, we experimentally investigate the degradation mechanisms of GaN high-
electron mobility transistors (HEMTs) with p-type gate during long-term hightemperature …

Gate stability of GaN-based HEMTs with p-type gate

M Meneghini, I Rossetto, V Rizzato, S Stoffels… - Electronics, 2016 - mdpi.com
This paper reports on an extensive investigation of the gate stability of GaN-based High
Electron Mobility Transistors with p-type gate submitted to forward gate stress. Based on …

Improved Interface Properties and Dielectric Breakdown in Recessed AlGaN/GaN MOS-HEMTs Using HfSiO as Gate Dielectric

S Li, Q Hu, X Wang, T Li, X Li… - IEEE Electron Device …, 2018 - ieeexplore.ieee.org
In this letter, we report optimized transport properties in gate recessed enhancement-mode
GaN MOS-HEMTs by incorporating silicon into atomic layer deposited gate dielectric HfO 2 …