Dual functional low surface energy coating of anti-corrosion/fouling via crosslinking polysilazane preceramic precursor incorporated with fluorine
A dual functional low surface energy coating with polysilazane preceramic precursor is
developed to form a silicon-based polymeric film. The result shows that the lowest surface …
developed to form a silicon-based polymeric film. The result shows that the lowest surface …
Correlation between ID⁄ IG ratio from visible raman spectra and sp2/sp3 ratio from XPS spectra of annealed hydrogenated DLC film
T FC, T SL - Materials transactions, 2006 - jstage.jst.go.jp
It is well known that there are a lot of analytical techniques used to quantify the versatile
properties of diamond-like carbon (DLC) film from different manufacturing processes. 1) …
properties of diamond-like carbon (DLC) film from different manufacturing processes. 1) …
Recent advances in the mechanical and tribological properties of fluorine-containing DLC films
L Zhang, F Wang, L Qiang, K Gao, B Zhang, J Zhang - RSC Advances, 2015 - pubs.rsc.org
Fluorine easily substitutes hydrogen in DLC films due to its monovalence and high
electronegativity. The peculiarities of fluorine bestow low surface energy, low inner stress …
electronegativity. The peculiarities of fluorine bestow low surface energy, low inner stress …
Antibacterial activity of fluorine incorporated DLC films
M Ishihara, T Kosaka, T Nakamura, K Tsugawa… - Diamond and Related …, 2006 - Elsevier
Fluorine incorporated diamond-like carbon (F-DLC) films were deposited by RF magnetron
sputtering method using a mixture of argon (Ar) and methane (CH4) and tetrafluoromethane …
sputtering method using a mixture of argon (Ar) and methane (CH4) and tetrafluoromethane …
The properties of fluorine containing diamond-like carbon films prepared by plasma-enhanced chemical vapour deposition
Films of diamond-like carbon containing up to 39.2 at.% fluorine (F-DLC) were deposited on
silicon substrates by radio frequency plasma-enhanced chemical vapour deposition (rf …
silicon substrates by radio frequency plasma-enhanced chemical vapour deposition (rf …
The properties of fluorine-containing diamond-like carbon films prepared by pulsed DC plasma-activated chemical vapour deposition
Diamond-like carbon films containing up to 23.1 at.% of fluorine (F-DLC), were deposited
onto silicon substrates by low-frequency, pulsed DC, plasma-activated, chemical vapour …
onto silicon substrates by low-frequency, pulsed DC, plasma-activated, chemical vapour …
Influence of structure evolution on tribological properties of fluorine-containing diamond-like carbon films: From fullerene-like to amorphous structures
J Wang, K Zhang, L Zhang, F Wang, J Zhang… - Applied Surface …, 2018 - Elsevier
Fluorine incorporation can tune the properties of diamond-like carbon (DLC) films
particularly to the tribological behaviors, which is closely related to the film inner structural …
particularly to the tribological behaviors, which is closely related to the film inner structural …
A comprehensive study on different silicon-containing interlayers for aC: H adhesion on ferrous alloys
Silicon-containing interlayers can be used to promote adhesion of aC: H thin films on ferrous
alloys substrates. In contrast to chromium and titanium intermediate layers, which are often …
alloys substrates. In contrast to chromium and titanium intermediate layers, which are often …
Surface stability and electronic structure of hydrogen-and fluorine-terminated diamond surfaces: A first-principles investigation
The effect of fluorine termination on the stability and bonding structure of diamond (111)
surfaces were studied using first-principles calculations and compared with hydrogen …
surfaces were studied using first-principles calculations and compared with hydrogen …
Characterization and haemocompatibility of fluorinated DLC and Si interlayer on Ti6Al4V
Fluorinated diamond-like carbon (F-DLC) films were deposited on Ti6Al4V substrates by
radio frequency plasma enhanced chemical vapor deposition (rf PECVD) technique using a …
radio frequency plasma enhanced chemical vapor deposition (rf PECVD) technique using a …