As the semiconductor industry advances, manufacturing technologies encounter challenges
in achieving precise alignment and thickness control with smaller and more intricate 3D …

Nanostructured NiCo 2 O 4 spinel is the most appealing candidate to be used as the
electrode for supercapacitors due to its significant merits such as eco-friendliness, low cost …

When the technology node of large-scale integrated circuit manufacturing develops to 5 nm
and below, cobalt is considered to replace the diffusion barrier layer Ta/TaN and still needs …

Utilising self-assembled monolayers (SAMs) to achieve area-selective atomic layer
deposition (AS-ALD) as an approach to bottom-up nanofabrication has recently gained …

Cobalt (Co) has been identified as the promising candidate material due to the technology
node goes down to 7nm and below. In this paper, the effect of diethylenetriamine …

Amine-terminated self-assembled monolayers are molecular nanolayers, typically formed
via wet-chemical solution on specific substrates for precision surface engineering or …

Alkane chains are the most commonly used molecules for monolayer fabrication. Long
chains are used for their strong van der Waals interactions inducing good layer organization …

Area-selective deposition (ASD) offers tremendous advantages when compared with
conventional patterning processes, such as the possibility of achieving three-dimensional …

In this work, we report on the effect of amino-terminated self-assembled monolayers (SAMs)
on the growth and adhesion of copper on a dielectric surface in ultra-high vacuum. The …

Self-assembled monolayers (SAMs) are the emerging materials to act as barriers in the back-
end-of-line interconnects for advanced technological nodes. In this study, SAMs were …