[HTML][HTML] Enabling nanotechnology with self assembled block copolymer patterns

C Park, J Yoon, EL Thomas - Polymer, 2003 - Elsevier
Block copolymers (BCPs) have received great attention for the past 40 years but only within
the past decade have they been seriously considered for nanotechnological applications …

Directing the self-assembly of block copolymers

SB Darling - Progress in polymer science, 2007 - Elsevier
Recently, a new spotlight has been focused on block copolymers, thoroughly studied for
nearly half a century, because of their potential use in numerous nanotechnologies. This …

Patterning with block copolymer thin films

RA Segalman - Materials Science and Engineering: R: Reports, 2005 - Elsevier
The nanometer-scale architectures in thin films of self-assembling block copolymers have
inspired a variety of new applications. For example, the uniformly sized and shaped …

Block copolymer thin films: Physics and applications

MJ Fasolka, AM Mayes - Annual Review of Materials Research, 2001 - annualreviews.org
▪ Abstract A two-part review of research concerning block copolymer thin films is presented.
The first section summarizes experimental and theoretical studies of the fundamental …

Ordering in thin films of block copolymers: Fundamentals to potential applications

IW Hamley - Progress in polymer science, 2009 - Elsevier
The ordering of block copolymers in thin films is reviewed, starting from the fundamental
principles and extending to recent promising developments as templates for …

Nanostructure fabrication using block copolymers

IW Hamley - Nanotechnology, 2003 - iopscience.iop.org
A brief overview is provided of recent developments in the use of block copolymer self-
assembly to create morphologies that may be used to template the fabrication of …

Using self-assembled monolayers exposed to X-rays to control the wetting behavior of thin films of diblock copolymers

RD Peters, XM Yang, TK Kim, BH Sohn, PF Nealey - Langmuir, 2000 - ACS Publications
The wetting behavior of thin films of symmetric poly (styrene-block-methyl methacrylate) was
investigated on self-assembled monolayers (SAMs) of octadecyltrichlorosilane (OTS) that …

Phase behavior in thin films of cylinder-forming ABA block copolymers: Experiments

A Knoll, R Magerle, G Krausch - The Journal of chemical physics, 2004 - pubs.aip.org
We experimentally establish a phase diagram of thin films of concentrated solutions of a
cylinder forming polystyrene-block-polybutadiene-block-polystyrene triblock copolymer in …

Fast assembly of ordered block copolymer nanostructures through microwave annealing

X Zhang, KD Harris, NLY Wu, JN Murphy, JM Buriak - Acs Nano, 2010 - ACS Publications
Block copolymer self-assembly is an innovative technology capable of patterning
technologically relevant substrates with nanoscale precision for a range of applications from …

Preparation of porous materials with ordered hole structure

MLK Hoa, M Lu, Y Zhang - Advances in colloid and interface science, 2006 - Elsevier
This review paper investigates the synthesis of porous structures with controlled hole pattern
and provides an overall view of the various factors involved when synthesizing such porous …