Synthesis of emerging 2D layered magnetic materials

M Och, MB Martin, B Dlubak, P Seneor, C Mattevi - Nanoscale, 2021 - pubs.rsc.org
van der Waals atomically thin magnetic materials have been recently discovered. They have
attracted enormous attention as they present unique magnetic properties, holding potential …

Hybrid and heterogeneous photonic integration

P Kaur, A Boes, G Ren, TG Nguyen, G Roelkens… - APL Photonics, 2021 - pubs.aip.org
Increasing demand for every faster information throughput is driving the emergence of
integrated photonic technology. The traditional silicon platform used for integrated …

Integration of GaAs, GaN, and Si-CMOS on a common 200 mm Si substrate through multilayer transfer process

KH Lee, S Bao, L Zhang, D Kohen… - Applied Physics …, 2016 - iopscience.iop.org
The integration of III–V semiconductors (eg, GaAs and GaN) and silicon-on-insulator (SOI)-
CMOS on a 200 mm Si substrate is demonstrated. The SOI-CMOS donor wafer is …

[HTML][HTML] Defects reduction of Ge epitaxial film in a germanium-on-insulator wafer by annealing in oxygen ambient

KH Lee, S Bao, GY Chong, YH Tan, EA Fitzgerald… - APL Materials, 2015 - pubs.aip.org
A method to remove the misfit dislocations and reduce the threading dislocations density
(TDD) in the germanium (Ge) epilayer growth on a silicon (Si) substrate is presented. The …

Fabrication and characterization of germanium-on-insulator through epitaxy, bonding, and layer transfer

KH Lee, S Bao, GY Chong, YH Tan… - Journal of Applied …, 2014 - pubs.aip.org
A scalable method to fabricate germanium on insulator (GOI) substrate through epitaxy,
bonding, and layer transfer is reported. The germanium (Ge) epitaxial film is grown directly …

Effects of surface tunneling of two-dimensional hole gases in undoped Ge/GeSi heterostructures

YH Su, Y Chuang, CY Liu, JY Li, TM Lu - Physical Review Materials, 2017 - APS
We investigate the effect of surface tunneling on charge distributions of two-dimensional
hole gases (2DHGs) in undoped Ge/GeSi heterostructures. As in the electron channel case …

Low temperature plasma enhanced CVD epitaxial growth of silicon on GaAs: a new paradigm for III-V/Si integration

R Cariou, W Chen, JL Maurice, J Yu, G Patriarche… - Scientific Reports, 2016 - nature.com
The integration of III-V semiconductors with silicon is a key issue for photonics,
microelectronics and photovoltaics. With the standard approach, namely the epitaxial growth …

Low-power and high-detectivity Ge photodiodes by in-situ heavy As do** during Ge-on-Si seed layer growth

Y Lin, KH Lee, B Son, CS Tan - Optics Express, 2021 - opg.optica.org
Germanium (Ge)-based photodetectors have become one of the mainstream components in
photonic-integrated circuits (PICs). Many emerging PIC applications require the …

Fast diffusion and segregation along threading dislocations in semiconductor heterostructures

B Bonef, RD Shah, K Mukherjee - Nano Letters, 2019 - ACS Publications
Heterogeneous integration of semiconductors combines the functionality of different
materials, enabling technologies such as III–V lasers and solar cells on silicon and GaN …

The role of AsH3 partial pressure on anti-phase boundary in GaAs-on-Ge grown by MOCVD–Application to a 200 mm GaAs virtual substrate

D Kohen, S Bao, KH Lee, KEK Lee, CS Tan… - Journal of Crystal …, 2015 - Elsevier
We demonstrate the influence of the arsine partial pressure (p (AsH 3)) on the quality of a
GaAs layer grown on Ge substrate by metal organic chemical vapor deposition. The GaAs …