[BOOK][B] Handbook of nitride semiconductors and devices, Materials Properties, Physics and Growth
H Morkoį - 2009 - books.google.com
The three volumes of this handbook treat the fundamentals, technology and nanotechnology
of nitride semiconductors with an extraordinary clarity and depth. They present all the …
of nitride semiconductors with an extraordinary clarity and depth. They present all the …
GaN in different dimensionalities: Properties, synthesis, and applications
Y Chen, J Liu, K Liu, J Si, Y Ding, L Li, T Lv… - Materials Science and …, 2019 - Elsevier
Wurtzite GaN materials underpin many aspects of optoelectronic applications due to the
special tetrahedral-coordinated structure. Compared with three dimensional (3D) GaN, low …
special tetrahedral-coordinated structure. Compared with three dimensional (3D) GaN, low …
Comprehensive characterization of hydride VPE grown GaN layers and templates
H Morkoç - Materials Science and Engineering: R: Reports, 2001 - Elsevier
GaN community has recently recognized that it is imperative that the extended, and point
defects in GaN and related materials, and the mechanisms for their formation are …
defects in GaN and related materials, and the mechanisms for their formation are …
Luminescence properties and defects in GaN nanocolumns grown by molecular beam epitaxy
Wurtzite GaN nanocolumns are reproducibly grown by plasma-assisted molecular beam
epitaxy on Si (111) and c-sapphire substrates. The nanocolumns density and diameter (600 …
epitaxy on Si (111) and c-sapphire substrates. The nanocolumns density and diameter (600 …
Metalorganic chemical vapor deposition of GaN on Si (111): Stress control and application to field-effect transistors
H Marchand, L Zhao, N Zhang, B Moran… - Journal of Applied …, 2001 - pubs.aip.org
Two schemes of nucleation and growth of gallium nitride on Si (111) substrates are
investigated and the structural and electrical properties of the resulting films are reported …
investigated and the structural and electrical properties of the resulting films are reported …
Growth of III-nitrides on Si (1 1 1) by molecular beam epitaxy Do**, optical, and electrical properties
E Calleja, MA Sánchez-Garcıa, FJ Sánchez… - Journal of crystal …, 1999 - Elsevier
The growth of high-quality III-nitrides by plasma-assisted molecular beam epitaxy on Si
(111) substrates is addressed. A combination of optimized AlN buffer layers and a two-step …
(111) substrates is addressed. A combination of optimized AlN buffer layers and a two-step …
Molecular Beam Epitaxy of Group‐III Nitrides on Silicon Substrates: Growth, Properties and Device Applications
We report on the growth and properties of GaN films grown on Si (111) substrates by
molecular beam epitaxy using ammonia. The properties of the layers show that our growth …
molecular beam epitaxy using ammonia. The properties of the layers show that our growth …
Photoluminescence and intrinsic properties of MBE-grown InN nanowires
The influence of the growth parameters on the photoluminescence (PL) spectra has been
investigated for samples with columnar morphology, either with InN columns on original …
investigated for samples with columnar morphology, either with InN columns on original …
Si complies with GaN to overcome thermal mismatches for the heteroepitaxy of thick GaN on Si
Heteroepitaxial growth of lattice mismatched materials has advanced through the epitaxy of
thin coherently strained layers, the strain sharing in virtual and nanoscale substrates, and …
thin coherently strained layers, the strain sharing in virtual and nanoscale substrates, and …
Vacancy defects as compensating centers in Mg-doped GaN
S Hautakangas, J Oila, M Alatalo, K Saarinen… - Physical review …, 2003 - APS
We apply positron annihilation spectroscopy to identify VN-M g G a complexes as native
defects in<? format?> Mg-doped GaN. These defects dissociate in postgrowth annealings at …
defects in<? format?> Mg-doped GaN. These defects dissociate in postgrowth annealings at …