Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends
Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …
suitable for depositing uniform and conformal films on complex three-dimensional …
Atomic layer deposition of metals: Precursors and film growth
DJ Hagen, ME Pemble, M Karppinen - Applied Physics Reviews, 2019 - pubs.aip.org
The coating of complex three-dimensional structures with ultrathin metal films is of great
interest for current technical applications, particularly in microelectronics, as well as for basic …
interest for current technical applications, particularly in microelectronics, as well as for basic …
Single-atom catalysts designed and prepared by the atomic layer deposition technique
The atomic layer deposition (ALD) technique allows the synthesis of materials at the atomic
scale to be controlled. ALD has been adapted to design and prepare single-atom catalysts …
scale to be controlled. ALD has been adapted to design and prepare single-atom catalysts …
Catalyst design with atomic layer deposition
Atomic layer deposition (ALD) has emerged as an interesting tool for the atomically precise
design and synthesis of catalytic materials. Herein, we discuss examples in which the atomic …
design and synthesis of catalytic materials. Herein, we discuss examples in which the atomic …
Atomic layer deposition of noble metals and their oxides
Atomic layer deposition (ALD) is an attractive method to deposit thin films for advanced
technological applications such as microelectronics and nanotechnology. One material …
technological applications such as microelectronics and nanotechnology. One material …
Néel-Type Skyrmion Lattice in the Tetragonal Polar Magnet
The formation of the triangular Skyrmion lattice is found in a tetragonal polar magnet VOSe 2
O 5. By magnetization and small-angle neutron scattering measurements on the single …
O 5. By magnetization and small-angle neutron scattering measurements on the single …
Capacitors with an equivalent oxide thickness of< 0.5 nm for nanoscale electronic semiconductor memory
The recent progress in the metal‐insulator‐metal (MIM) capacitor technology is reviewed in
terms of the materials and processes mostly for dynamic random access memory (DRAM) …
terms of the materials and processes mostly for dynamic random access memory (DRAM) …
Electrocatalysts by atomic layer deposition for fuel cell applications
Fuel cells are a promising technology solution for reliable and clean energy because they
offer high energy conversion efficiency and low emission of pollutants. However, high cost …
offer high energy conversion efficiency and low emission of pollutants. However, high cost …
Diffusion‐Mediated Growth and Size‐Dependent Nanoparticle Reactivity during Ruthenium Atomic Layer Deposition on Dielectric Substrates
J Soethoudt, F Grillo, EA Marques… - Advanced materials …, 2018 - Wiley Online Library
Understanding the growth mechanisms during the early stages of atomic layer deposition
(ALD) is of interest for several applications including thin film deposition, catalysis, and area …
(ALD) is of interest for several applications including thin film deposition, catalysis, and area …
Ultrathin Metal Films with Low Resistivity via Atomic Layer Deposition: Process Pressure Effect on Initial Growth Behavior of Ru Films
NG Kang, MJ Ha, JH Ahn - Chemistry of Materials, 2024 - ACS Publications
Because semiconductor devices have become ultraminiaturized, the degradation of
conductivity due to the resistivity size effect of metal thin films is an unavoidable problem …
conductivity due to the resistivity size effect of metal thin films is an unavoidable problem …