Processing at the atomic scale is becoming increasingly critical for state-of-the-art electronic
devices for computing and data storage, but also for emerging technologies such as related …

Conspectus Atomic layer control of semiconductor processing is needed as critical
dimensions are progressively reduced below the 10 nm scale. Atomic layer deposition …

Abstract Journal of Physics D: Applied Physics published the first Plasma Roadmap in 2012
consisting of the individual perspectives of 16 leading experts in the various sub-fields of low …

The 2022 Roadmap is the next update in the series of Plasma Roadmaps published by
Journal of Physics D with the intent to identify important outstanding challenges in the field of …

Atomic layer deposition (ALD) is a technology offering the possibility to prepare thin films of
high quality materials on high aspect ratio substrates with precise thickness control, high …

Due to their tiny size, autonomous motion and functionalize modifications, micro/nanomotors
have shown great potential for environmental remediation, biomedicine and micro/nano …

Atomic layer deposition (ALD) is well known as the most advanced coating technique so far
due to its unique deposition characteristics, such as uniformity and 3D conformality. ALD is …

In plasmas, a variety of radicals which are defined as electrically neutral radicals in this
article are efficiently produced by collisions between electrons and gas molecules. These …

Thermal atomic layer etching (ALE) of Al2O3 and HfO2 using sequential, self-limiting
fluorination and ligand-exchange reactions was recently demonstrated using HF and tin …

Low temperature plasma (LTP)-based synthesis of advanced materials has played a
transformational role in multiple industries, including the semiconductor industry, liquid …