Tailored-waveform excitation of capacitively coupled plasmas and the electrical asymmetry effect
T Lafleur - Plasma Sources Science and Technology, 2015 - iopscience.iop.org
Unequal areas of the powered and grounded electrodes in single-frequency capacitively
coupled plasmas (CCPs) are well-known to generate a DC self-bias voltage and an …
coupled plasmas (CCPs) are well-known to generate a DC self-bias voltage and an …
[BOOK][B] An introduction to laboratory space and fusion plasma
A Piel - 2010 - Springer
The enlarged new edition of this textbook provides a comprehensive introduction to the
basic processes in plasmas and demonstrates that the same fundamental concepts describe …
basic processes in plasmas and demonstrates that the same fundamental concepts describe …
A tutorial on radio frequency sheath physics for magnetically confined fusion devices
JR Myra - Journal of Plasma Physics, 2021 - cambridge.org
Radio frequency (RF) sheaths occur under a wide variety of conditions when RF waves,
material surfaces and plasma coexist. RF sheaths are of special importance in describing …
material surfaces and plasma coexist. RF sheaths are of special importance in describing …
Foundations of capacitive and inductive radio-frequency discharges
P Chabert, TV Tsankov… - Plasma Sources Science …, 2021 - iopscience.iop.org
This paper is the first from a set of two companion papers on radio-frequency (RF)
discharges. These two papers are in turn part of a larger series on the foundations of plasma …
discharges. These two papers are in turn part of a larger series on the foundations of plasma …
The role of electron induced secondary electron emission from SiO2 surfaces in capacitively coupled radio frequency plasmas operated at low pressures
The effects of electron induced secondary electron (SE) emission from SiO 2 electrodes in
single-frequency capacitively coupled plasmas (CCPs) are studied by particle-in-cell/Monte …
single-frequency capacitively coupled plasmas (CCPs) are studied by particle-in-cell/Monte …
Precise ion energy control with tailored waveform biasing for atomic scale processing
T Faraz, YGP Verstappen, MA Verheijen… - Journal of Applied …, 2020 - pubs.aip.org
Anisotropic plasma-enhanced atomic layer etching (ALE) requires directional ions with a
well-defined ion energy to remove materials in a highly selective and self-limiting fashion. In …
well-defined ion energy to remove materials in a highly selective and self-limiting fashion. In …
Multi-diagnostic experimental validation of 1d3v PIC/MCC simulations of low pressure capacitive RF plasmas operated in argon
The particle-in-cell/Monte Carlo collisions (PIC/MCC) simulation approach has become a
standard and well-established tool in studies of capacitively coupled radio frequency (RF) …
standard and well-established tool in studies of capacitively coupled radio frequency (RF) …
The effect of electron induced secondary electrons on the characteristics of low-pressure capacitively coupled radio frequency plasmas
We investigate the effects of secondary electrons (SEs), induced by electrons im**ing on
the electrodes, on the characteristics of low-pressure single-frequency capacitively coupled …
the electrodes, on the characteristics of low-pressure single-frequency capacitively coupled …
Effects of fast atoms and energy-dependent secondary electron emission yields in PIC/MCC simulations of capacitively coupled plasmas
In most PIC/MCC simulations of radio frequency capacitively coupled plasmas (CCPs)
several simplifications are commonly made:(i) fast neutrals are not traced,(ii) heavy particle …
several simplifications are commonly made:(i) fast neutrals are not traced,(ii) heavy particle …
Electron dynamics in radio frequency magnetron sputtering argon discharges with a dielectric target
We demonstrate a self-consistent and complete description of electron dynamics in a typical
electropositive radio frequency magnetron sputtering (RFMS) argon discharge with a …
electropositive radio frequency magnetron sputtering (RFMS) argon discharge with a …