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Substrate processing method and device manufactured by using the same
YK Min - US Patent 11,361,990, 2022 - Google Patents
H01L21/02263—Forming insulating materials on a substrate characterised by the process
for the formation of the insulating layer formation by a deposition process deposition from the …
for the formation of the insulating layer formation by a deposition process deposition from the …
Substrate processing system
YK Min, Y Kim, H Lee, SJ Chun - US Patent 11,530,483, 2022 - Google Patents
2019-08-30 Assigned to ASM IP HOLDING BV reassignment ASM IP HOLDING BV
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors …
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors …
Method for selectively depositing a metallic film on a substrate
D Longrie, DK De Roest - US Patent 11,094,546, 2021 - Google Patents
D56, 051 S 2,059,480 A 2,161,626 A 2,240,163 A 2,266,416 A 2,280,778 A D142, 841 S
2,410,420 A 2,441,253 A 2,480,557 A 2,563,931 A 2,660,061 A 2,745,640 A 2,847,320 A …
2,410,420 A 2,441,253 A 2,480,557 A 2,563,931 A 2,660,061 A 2,745,640 A 2,847,320 A …
Gas-phase chemical reactor and method of using same
AJ Niskanen - US Patent 11,286,562, 2022 - Google Patents
A gas-phase chemical reactor, a system including the reac tor, and methods of using the
reactor and system are dis closed. An exemplary reactor includes a reaction chamber and is …
reactor and system are dis closed. An exemplary reactor includes a reaction chamber and is …
Reactor, system including the reactor, and methods of manufacturing and using same
(57) ABSTRACT A reactor for processing substrates and methods for manu facturing and
using the reactor are disclosed. Specifically, the reactor can include a material that forms …
using the reactor are disclosed. Specifically, the reactor can include a material that forms …
Semiconductor processing apparatus comprising one or more pyrometers for measuring a temperature of a substrate during transfer of the substrate
M Verghese, T Dunn, JK Shugrue - US Patent 11,629,406, 2023 - Google Patents
2018-03-09 Assigned to ASM IP HOLDING BV reassignment ASM IP HOLDING BV
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors …
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors …
Method of forming a germanium oxynitride film
F Tang, Q **e, JW Maes, X Jiang… - US Patent 11,101,370, 2021 - Google Patents
(54) METHOD OF FORMING A GERMANIUM OXYNITRIDE FILM 21/0228; HO1L 29/40117;
HOIL 29/66833; HO1L 21/285; HO1L 27/11582;
HOIL 29/66833; HO1L 21/285; HO1L 27/11582;
Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
2020-11-07 Assigned to ASM IP HOLDING BV reassignment ASM IP HOLDING BV
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors …
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors …
Substrate processing apparatus and method
D Pierreux, CT Herbschleb, W Knaepen… - US Patent …, 2022 - Google Patents
2021-09-29 Assigned to ASM IP HOLDING BV reassignment ASM IP HOLDING BV
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors …
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors …
Semiconductor processing apparatus and a method for processing a substrate
P Raisanen, D Marquardt, T Aswad - US Patent 11,473,195, 2022 - Google Patents
C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL;
CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; …
CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; …