Progress and future prospects of negative capacitance electronics: A materials perspective
Negative capacitance in ferroelectric materials has been suggested as a solution to reduce
the power dissipation of electronics beyond fundamental limits. The discovery of …
the power dissipation of electronics beyond fundamental limits. The discovery of …
Proposal for capacitance matching in negative capacitance field-effect transistors
Negative-capacitance transistors use ferroelectric (FE) material in the gate-stack to improve
the transistor performance. The extent of the improvement depends on the capacitance …
the transistor performance. The extent of the improvement depends on the capacitance …
Negative capacitance field-effect transistors based on ferroelectric AlScN and 2D MoS2
Al 0.68 Sc 0.32 N (AlScN) has gained attention for its outstanding ferroelectric properties,
including a high coercive field and high remnant polarization. Although AlScN-based …
including a high coercive field and high remnant polarization. Although AlScN-based …
Modeling the threshold voltage of core-and-outer gates of ultra-thin nanotube Junctionless-double gate-all-around (NJL-DGAA) MOSFETs
The present article deals with the analytical modeling of threshold voltage of an ultra-thin
nanotube Junctionless double-gate-all-around (NJL-DGAA) metal-oxide-semiconductor field …
nanotube Junctionless double-gate-all-around (NJL-DGAA) metal-oxide-semiconductor field …
Analysis and modeling of inner fringing field effect on negative capacitance FinFETs
We investigate the impact of inner fringing fields on the negative capacitance FinFET (NC-
FinFET) and how this scales with the technology node. The 8-/7-nm technology node of the …
FinFET) and how this scales with the technology node. The 8-/7-nm technology node of the …
Implementation and performance evaluation of ferroelectric negative capacitance FET
With the constant increase in power dissipation of nanoscale transistors, the almost four-
decade-old cycle of performance advancement in complementary metal–oxide …
decade-old cycle of performance advancement in complementary metal–oxide …
Negative capacitance junctionless FinFET for low power applications: an innovative approach
Recently, increasing power leakage has become a major concern especially in MOSFET
based nanoscale devices due to poor gate control. To mitigate these problems, the devices …
based nanoscale devices due to poor gate control. To mitigate these problems, the devices …
CMOS Scaling for the 5 nm Node and Beyond: Device, Process and Technology
HH Radamson, Y Miao, Z Zhou, Z Wu, Z Kong, J Gao… - Nanomaterials, 2024 - mdpi.com
After more than five decades, Moore's Law for transistors is approaching the end of the
international technology roadmap of semiconductors (ITRS). The fate of complementary …
international technology roadmap of semiconductors (ITRS). The fate of complementary …
Negative drain-induced barrier lowering and negative differential resistance effects in negative-capacitance transistors
T Yu, W Lü, Z Zhao, P Si, K Zhang - Microelectronics Journal, 2021 - Elsevier
In this study, the negative drain-induced barrier lowering (DIBL) and negative differential
resistance (NDR) effects are investigated in detail in negative-capacitance field-effect …
resistance (NDR) effects are investigated in detail in negative-capacitance field-effect …
A Steep Slope MBE-Grown Thin p-Ge Channel FETs on Bulk Ge-on-Si Using HZO Internal Voltage Amplification
S Choudhary, D Schwarz, HS Funk… - … on Electron Devices, 2022 - ieeexplore.ieee.org
There are vital challenges to harness the unique assets of germanium (Ge) because of Ge-
on-insulator (GeOI) processing issues. The advances in molecular beam epitaxy (MBE) …
on-insulator (GeOI) processing issues. The advances in molecular beam epitaxy (MBE) …