Progress and future prospects of negative capacitance electronics: A materials perspective

M Hoffmann, S Slesazeck, T Mikolajick - APL Materials, 2021 - pubs.aip.org
Negative capacitance in ferroelectric materials has been suggested as a solution to reduce
the power dissipation of electronics beyond fundamental limits. The discovery of …

Proposal for capacitance matching in negative capacitance field-effect transistors

H Agarwal, P Kushwaha, YK Lin… - IEEE Electron …, 2019 - ieeexplore.ieee.org
Negative-capacitance transistors use ferroelectric (FE) material in the gate-stack to improve
the transistor performance. The extent of the improvement depends on the capacitance …

Negative capacitance field-effect transistors based on ferroelectric AlScN and 2D MoS2

S Song, KH Kim, S Chakravarthi, Z Han, G Kim… - Applied Physics …, 2023 - pubs.aip.org
Al 0.68 Sc 0.32 N (AlScN) has gained attention for its outstanding ferroelectric properties,
including a high coercive field and high remnant polarization. Although AlScN-based …

Modeling the threshold voltage of core-and-outer gates of ultra-thin nanotube Junctionless-double gate-all-around (NJL-DGAA) MOSFETs

N Kumar, V Purwar, H Awasthi, R Gupta, K Singh… - Microelectronics …, 2021 - Elsevier
The present article deals with the analytical modeling of threshold voltage of an ultra-thin
nanotube Junctionless double-gate-all-around (NJL-DGAA) metal-oxide-semiconductor field …

Analysis and modeling of inner fringing field effect on negative capacitance FinFETs

YK Lin, H Agarwal, P Kushwaha… - … on Electron Devices, 2019 - ieeexplore.ieee.org
We investigate the impact of inner fringing fields on the negative capacitance FinFET (NC-
FinFET) and how this scales with the technology node. The 8-/7-nm technology node of the …

Implementation and performance evaluation of ferroelectric negative capacitance FET

R Deepa, MP Devi, NA Vignesh, S Kanithan - Silicon, 2022 - Springer
With the constant increase in power dissipation of nanoscale transistors, the almost four-
decade-old cycle of performance advancement in complementary metal–oxide …

Negative capacitance junctionless FinFET for low power applications: an innovative approach

S Kaushal, AK Rana - Silicon, 2022 - Springer
Recently, increasing power leakage has become a major concern especially in MOSFET
based nanoscale devices due to poor gate control. To mitigate these problems, the devices …

CMOS Scaling for the 5 nm Node and Beyond: Device, Process and Technology

HH Radamson, Y Miao, Z Zhou, Z Wu, Z Kong, J Gao… - Nanomaterials, 2024 - mdpi.com
After more than five decades, Moore's Law for transistors is approaching the end of the
international technology roadmap of semiconductors (ITRS). The fate of complementary …

Negative drain-induced barrier lowering and negative differential resistance effects in negative-capacitance transistors

T Yu, W Lü, Z Zhao, P Si, K Zhang - Microelectronics Journal, 2021 - Elsevier
In this study, the negative drain-induced barrier lowering (DIBL) and negative differential
resistance (NDR) effects are investigated in detail in negative-capacitance field-effect …

A Steep Slope MBE-Grown Thin p-Ge Channel FETs on Bulk Ge-on-Si Using HZO Internal Voltage Amplification

S Choudhary, D Schwarz, HS Funk… - … on Electron Devices, 2022 - ieeexplore.ieee.org
There are vital challenges to harness the unique assets of germanium (Ge) because of Ge-
on-insulator (GeOI) processing issues. The advances in molecular beam epitaxy (MBE) …