Small angle x-ray scattering (SAXS) stands out as a promising solution in semiconductor
metrology. The critical issue of SAXS metrology is to solve the SAXS inverse problem. With …

Increasing miniaturization and complexity of nanostructures require innovative metrology
solutions with high throughput that can assess complex 3D structures in a non-destructive …

The increasing importance of well-controlled ordered nanostructures on surfaces represents
a challenge for existing metrology techniques. To develop such nanostructures and monitor …

Small angle x-ray scattering (SAXS) is a widely recognized solution for measuring complex
nanostructures. With the increasing demand for accurately assessing structural …

Grazing-incidence small-angle X-ray scattering (GI-SAXS) is a promising technique for
investigating nanostructured surfaces, particularly for the fine pitch calibration of one …

Parameter reconstructions are indispensable in metrology. Here, the objective is to explain
K experimental measurements by fitting to them a parameterized model of the measurement …

The characterization of nanostructured surfaces with sensitivity in the sub-nm range is of
high importance for the development of current and next-generation integrated electronic …

The grazing emission X-ray fluorescence (GEXRF) technique offers a promising approach to
determining the spatial distribution of various chemical elements in nanostructures. In this …

The Metrology Chapter identifies emerging measurement challenges from devices, systems,
and integration of new materials in the semiconductor industry and describes research and …

Critical dimension control is essential in the semiconductor industry and becomes more
challenging as photolithography limits keep getting pushed to reach technological nodes …