Plasma afterglows interacting with dust grains present a dynamic environment in which
negatively charged dust grains leaving the plasma bulk experience an environment with …

Dusty plasmas are electrically quasi-neutral media that, along with electrons, ions, neutral
gas, radiation, and electric and/or magnetic fields, also contain solid or liquid particles with …

An emerging topic in complex plasma physics is the interaction between dust particles and
afterglow plasmas. Control of plasma-particle interactions and specifically of the particle …

Extreme UV (EUV) lithography is the most advanced lithography technology for creating the
patterns for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm …

In recent years, EUV lithography scanner systems have entered high-volume manufacturing
for state-of-the-art integrated circuits, with critical dimensions down to 10 nm. This …

In the growing field of dusty afterglow plasma physics, the key parameter is the residual
charge of dust particles. However, the particle (de)-charging process in afterglow plasmas is …

After years of efforts, extreme-ultraviolet (EUV) lithography reached a significant milestone in
2018: readiness for high-volume production of advanced semiconductor devices. A EUV …

With the introduction of the NXE: 3400B scanner, ASML has brought EUV to High-Volume
Manufacturing (HVM). In this context, ASML is pursuing a dual-path approach towards zero …

In the past year, EUV lithography scanner systems have entered High-Volume
Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 …

The stability of micrometer sized particles in hydrogen plasma is essential for extreme
ultraviolet lithography, the ITER fusion program and the application of hydrogen plasma …