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A critical review on performance, reliability, and fabrication challenges in nanosheet FET for future analog/digital IC applications
This article critically reviews the fabrication challenges, emerging materials (wafer, high-k
oxide, gate metal, channel materials), dimensional influences, thermal effects, growth …
oxide, gate metal, channel materials), dimensional influences, thermal effects, growth …
Benchmarking of multi-bridge-channel FETs toward analog and mixed-mode circuit applications
In this study, for the very first time develo** of n-and p-type 3-D single-channel (SC)
FinFET and gate-all-around (GAA) Multi-Bridge-Channel FETs (MBCFET) like nanowire FET …
FinFET and gate-all-around (GAA) Multi-Bridge-Channel FETs (MBCFET) like nanowire FET …
Spacer dielectric analysis of multi-channel nanosheet FET for nanoscale applications
This work investigates the effect of single and dual-k spacer materials consisting of different
dielectric constants (k) in optimized nano-channel gate-stack nanosheet (NS-FET) …
dielectric constants (k) in optimized nano-channel gate-stack nanosheet (NS-FET) …
Nanosheet Field Effect Transistor Device and Circuit Aspects for Future Technology Nodes
Moore's law states that the technical innovations are being absorbed already. The device's
controllability has dramatically improved since moving from a straightforward MOSFET …
controllability has dramatically improved since moving from a straightforward MOSFET …
Demonstration of a nanosheet FET with high thermal conductivity material as buried oxide: Mitigation of self-heating effect
Self-heating-induced thermal degradation is a severe issue in nonplanar MOS architectures.
Especially in stacked gate-all-around (GAA) nanosheet FET (NSFET), the self-heating effect …
Especially in stacked gate-all-around (GAA) nanosheet FET (NSFET), the self-heating effect …
Performance Improvement of Spacer-engineered N-type Tree Shaped NSFET towards Advanced Technology nodes
Tree-shaped Nanosheet FETS (NSFET) is the most dependable way to scale down the gate
lengths deep. This paper investigates the 12nm gate length (LG) n-type Tree-shaped NSFET …
lengths deep. This paper investigates the 12nm gate length (LG) n-type Tree-shaped NSFET …
Design of resistive load inverter and common source amplifier circuits using symmetric and asymmetric nanowire FETs
In this paper, multi-channel nanowire (NW) performance is significantly improved by
symmetric and asymmetric spacer length optimization. Device performance metrics …
symmetric and asymmetric spacer length optimization. Device performance metrics …
Impact of scaling on nanosheet FET and CMOS circuit applications
NA Kumari, VB Sreenivasulu… - ECS Journal of Solid State …, 2023 - iopscience.iop.org
In this paper, the impact of scaling on the gate all around the nanosheet field effect transistor
(GAA NSFET) is assessed in detail at sub-5-nm nodes for digital and analog/RF …
(GAA NSFET) is assessed in detail at sub-5-nm nodes for digital and analog/RF …
Characterization for Sub-5nm technology nodes of junctionless gate-all-around nanowire FETs
AS Kumar, M Deekshana… - 2022 13th …, 2022 - ieeexplore.ieee.org
According to Moore's law, there have been numerous technological advancements that are
currently being processed. The controllability of the device has improved significantly since …
currently being processed. The controllability of the device has improved significantly since …
Common source amplifier and ring oscillator circuit performance optimization using multi-bridge channel FETs
In this paper the DC, analog/RF device and circuit applications of nanosheet (NS) FET is
performed. To enhance power performance co-optimization geometry parameters like NS …
performed. To enhance power performance co-optimization geometry parameters like NS …