Cryogenic atomic layer etching (ALE) represents a promising technique for achieving
subnanoscale material removal in semiconductor processes, owing to its unique self-limiting …

Fundamental aspects of ferroelectric HfO 2⁠, a fluorite-type oxide, are not understood yet.
This is evident by different theories regarding, eg, the wake-up effect or the antiferroelectric …

Although the recently developed cutoff probe is a promising tool to precisely infer plasma
electron density by measuring the cutoff frequency (f cutoff) in the S 21 spectrum, it is …

This study proposed the fluidization-like dielectric barrier discharge (DBD) plasma for the
remediation of lindane contaminated soil and integrated physical and chemical reaction …

In a quantum plasma with strongly coupled ions and Fermi degenerate electron fluids,
features of low frequency wave dispersion and nonlinear electrostatic structure formation are …

The surface finish of organic and inorganic materials treated by gaseous plasma usually
depends on the fluxes and fluencies of chemically reactive species such as molecular …

Capacitively coupled plasma (CCP) discharges working at low pressure are widely used for
the synthesis of thin films and the modification of the surface properties of materials. Due to …

Graphene sheet transferred onto the SiO 2 substrate has various types at different regions
such as single-layer graphene (SLG), double-layer graphene (DLG), and multi-layer …

Rapid and accurate system evolution predictions are crucial in scientific and engineering
research. However, the complexity of processing systems, involving multiple physical field …

As the importance of ion-assisted surface processing based on low-temperature plasma
increases, the monitoring of ion energy im**ing into wafer surfaces becomes important …