SU-8 has become the favourite photoresist for high-aspect-ratio (HAR) and three-
dimensional (3D) lithographic patterning due to its excellent coating, planarization and …

Recent innovations in the area of micro-and nanofabrication have created a unique
opportunity for patterning surfaces with features with lateral dimensions spanning over the …

Point focus x-ray mosaic lenses are limited in aperture by the aspect ratio that can be
reached in the micro fabrication process. In lithography based micro fabrication processes …

We have previously demonstrated that it is possible to fabricate densely-packed high aspect
ratio structures in SU-8 by means of a top-plate support member which stiffens the overall …

Densely packed high aspect ratio structures are difficult to fabricate due to surface adhesion
effects which lead to pattern collapse during processing. However, it is possible to fabricate …

Many defects are generated in densely packed high aspect ratio structures during
nanofabrication. Pattern collapse is one of the serious problems that may arise, mainly due …

We propose a novel one-step exposure method for fabricating three-dimensional (3D)
suspended structures, utilizing the diffraction of mask patterns with small line width. An …

Fabrications of high-aspect-ratio microstructures (HARMS) using negative photoresist have
been studied a lot by researchers recently, but the removal of the resist is still a problem. We …

We have previously considered some of the parameters for, and production issues involved
in making, a useful Lobster-eye prototype using X-ray lithography. Due to the high aspect …

X-ray lithographic conditions for high aspect ratio SU-8 resist structures are characterized for
potential application in x-ray optics and bioMEMS. The effects of the main process …