This study deals with the fabrication and characterization of silicon nanoparticles in a SiN x
dielectric matrix to have thin films of different gap energies, films essentially based on …

This study presents a novel approach for achieving a high deposition rate of nanocrystalline
hydrogenated silicon (nc-Si: H) thin films using dusty plasma, eliminating the need for …

An efficient technique for low temperature metal‐induced nanocrystalline silicon fabrication
is presented. The technique is based on laser annealing of thin films of “amorphous silicon …

Temperature dependent conductivity measurements were performed on phosphine doped
hydrogenated amorphous silicon grown by plasma enhanced chemical vapor deposition …

This work describes tin‐induced crystallization of amorphous silicon studied with Raman
spectroscopy in thin‐film structures Si‐Sn‐Si irradiated with pulsed laser light. We have …

Different processes are used to improve the deposition of a nanocrystalline silicon layer to
enhance optical absorption in different devices. The difficulty encountered lies in the …

The peculiarities of surface relief of the Si‐Sn‐Si layered films, used to produce the silicon
nanocrystals with properties of quantum dots, were studied by the methods of electron and …

Careful analysis and investigations of the formation mechanism of the microstructure of the
hydrogenated nanocrystalline silicon (nc-Si: H) film is presented. A systematic approach is …

The influence of the laser light intensity and the temperature on the tin-induced
crystallization of amorphous silicon has been studied using the Raman screening and …

Defects in Nanocrystals: Structural and Physico-Chemical Aspects discusses the nature of
semiconductor systems and the effect of the size and shape on their thermodynamic and …