High power pulsed magnetron sputtering (HPPMS) is an emerging technology that has
gained substantial interest among academics and industrials alike. HPPMS, also known as …

High power impulse magnetron sputtering (HiPIMS) has been at the center of attention over
the last years as it is an emerging physical vapor deposition (PVD) technology that …

Magnetron sputtering deposition has become the most widely used technique for deposition
of both metallic and compound thin films and is utilized in numerous industrial applications …

The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to
plasma based sputtering technology. In HiPIMS, high power is applied to the magnetron …

High-power impulse magnetron sputtering (HiPIMS) is a promising sputtering-based ionized
physical vapor deposition technique and is already making its way to industrial applications …

Deposition by high power impulse magnetron sputtering (HIPIMS) is considered by some as
the new paradigm of advanced sputtering technology, yet this is met with skepticism by …

TiAlSiN nanocomposite coatings were deposited onto cemented carbide (WC-10 wt.%, Co)
substrates by high power impulse magnetron sputtering (HiPIMS). The effect of substrate …

Substrate bias voltage has a presumably predominant and significant influence on the
microstructural morphology and mechanical properties of HiPIMS deposited coatings. In the …

The physical and chemical aspects of plasma–surface interaction in high-power impulse
magnetron sputtering (HiPIMS) discharges are overviewed. The data obtained by various …

Magnetron sputtering is a plasma-based Physical Vapor Deposition technique for synthesis
of surface coatings. In the present survey, we have summarized and discussed in detail both …