Conductive and semiconductive oxides constitute a class of materials of which the electrical
conductivity and optical transparency can be modulated through material design (eg, do** …

Atomic layer deposition is widely acknowledged as a powerful technique for the deposition
of high quality layers for several applications including photovoltaics (PV). The capability of …

In the past decade, atomic layer deposition (ALD) has become an important thin film
deposition technique for applications in nanoelectronics, catalysis, and other areas due to its …

A highly transparent passivating contact (TPC) used for high‐efficiency crystalline silicon (c‐
Si) solar cells should meet several key criteria: high optical transparency, excellent c‐Si …

Highly conductive and optical transparent Al-doped ZnO (AZO) thin film composed of ZnO
with a Zn–Al–O interface was fabricated by thermal atomic layer deposition (ALD) method …

This article reviews the process-structure-property relationship in doped ZnO thin films via
atomic layer deposition (ALD). ALD is an important manufacturing-scalable, layer-by-layer …

Atomic layer deposition (ALD), also referred to historically as atomic layer epitaxy, is a vapor-
phase deposition technique for preparing ultra-thin films with precise growth control. ALD is …

Stacks consisting of an ultrathin SiO 2 coated with atomic-layer deposited (ALD) zinc oxide
(ZnO) and aluminum oxide (Al 2 O 3) have been shown to yield state-of-the-art passivation …

Abstract Deposition of Al-doped ZnO (AZO) and Al/F co-doped ZnO (FAZO) thin films in an
ALD “batch-type” reactor at temperature of 200° C was presented. AZO films with various Al …

Despite the existence of several highly effective and well-characterized passivating
materials for crystalline silicon surfaces, the topic of surface passivation and the …