[HTML][HTML] Surface transfer do** of diamond: A review

KG Crawford, I Maini, DA Macdonald… - Progress in Surface …, 2021 - Elsevier
Ultra-wide bandgap materials show great promise as a solution to some of the limitations of
current state of the art semiconductor technology. Among these, diamond has exhibited …

Diamond power devices: state of the art, modelling, figures of merit and future perspective

N Donato, N Rouger, J Pernot… - Journal of Physics D …, 2019 - iopscience.iop.org
With its remarkable electro-thermal properties such as the highest known thermal
conductivity (~ 22 W cm− 1 bold dot K− 1 at RT of any material, high hole mobility (> 2000 …

Normally-off HfO2-gated diamond field effect transistors

JW Liu, MY Liao, M Imura, Y Koide - applied physics letters, 2013 - pubs.aip.org
A normally-off hydrogenated-diamond (H-diamond) field effect transistor (FET) using a HfO 2
gate oxide is demonstrated. The HfO 2 gate oxide has a bilayer structure which is fabricated …

Comparative investigation of surface transfer do** of hydrogen terminated diamond by high electron affinity insulators

C Verona, W Ciccognani, S Colangeli, E Limiti… - Journal of Applied …, 2016 - pubs.aip.org
We report on a comparative study of transfer do** of hydrogenated single crystal diamond
surface by insulators featured by high electron affinity, such as Nb 2 O 5, WO 3, V 2 O 5, and …

Logic circuits with hydrogenated diamond field-effect transistors

J Liu, H Ohsato, M Liao, M Imura… - IEEE Electron …, 2017 - ieeexplore.ieee.org
As a first step to develop a diamond integrated circuit, hydrogenated diamond not and nor
logic circuits composed of depletion-mode (D-mode) and enhancement-mode (E-mode) …

Hydrogen-terminated diamond field-effect transistors with cutoff frequency of 53 GHz

SAO Russell, S Sharabi, A Tallaire… - IEEE Electron Device …, 2012 - ieeexplore.ieee.org
Homoepitaxial diamond has been used to demonstrate the RF performance of 50-nm gate
length hydrogen-terminated diamond field-effect transistors. An extrinsic cutoff frequency of …

Band offsets of Al2O3 and HfO2 oxides deposited by atomic layer deposition technique on hydrogenated diamond

JW Liu, MY Liao, M Imura, Y Koide - Applied Physics Letters, 2012 - pubs.aip.org
High-k oxide insulators (Al 2 O 3 and HfO 2) have been deposited on a single crystalline
hydrogenated diamond (H-diamond) epilayer by an atomic layer deposition technique at …

Interfacial band configuration and electrical properties of LaAlO3/Al2O3/hydrogenated-diamond metal-oxide-semiconductor field effect transistors

JW Liu, MY Liao, M Imura, H Oosato… - Journal of Applied …, 2013 - pubs.aip.org
In order to search a gate dielectric with high permittivity on hydrogenated-diamond (H-
diamond), LaAlO 3 films with thin Al 2 O 3 buffer layers are fabricated on the H-diamond …

Deposition of TiO2/Al2O3 bilayer on hydrogenated diamond for electronic devices: Capacitors, field-effect transistors, and logic inverters

JW Liu, MY Liao, M Imura, RG Banal… - Journal of Applied …, 2017 - pubs.aip.org
The wide bandgap semiconductor diamond has been studied to develop high-power and
high-frequency electronic devices. Here, high dielectric constant (high-k) TiO 2/Al 2 O 3 …

Influence investigation of CaF2 on the LAS based glass-ceramics and the glass-ceramic/diamond composites

D Feng, Y Zhu, F Li, Z Li - Journal of the European Ceramic Society, 2016 - Elsevier
Abstract Effects of CaF 2 on the LAS based glass-ceramics and glass-ceramic/diamond
composites have been systematically researched. Structure of glass-ceramics was analyzed …