Study of analog/Rf and stability investigation of surrounded gate junctionless graded channel MOSFET (SJLGC MOSFET)

S Misra, SM Biswal, B Baral, SK Swain, SK Pati - Silicon, 2021 - Springer
This paper explores the potential advantage of surrounded gate junctionless graded
channel (SJLGC) MOSFET in the view of its Analog, RF performances using ATLAS TCAD …

Comprehensive characterization of a high‐performance double heterojunction InGaAs pHEMT for linear power‐efficient amplifiers applications

S Sultana, J Naima, MS Alam, MS Alam… - … Journal of Numerical …, 2024 - Wiley Online Library
This article centers its attention on the phenomenon of electrostatics, linearity, analogue,
and RF performance of a 0.5 μm×(2× 100) μm double heterojunction AlGaAs/InGaAs/GaAs …

Performance analysis of gate stack DG-MOSFET for biosensor applications

SK Parija, SK Swain, SM Biswal, S Adak, P Dutta - Silicon, 2022 - Springer
In this paper the performance of gate stack metal oxide semiconductor field effect transistor
(MOSFET) is investigated with respect to different bio molecules for application as biosensor …

Study on analog/RF and linearity performance of staggered heterojunction gate stack tunnel FET

SM Biswal, SK Das, S Misra, U Nanda… - ECS Journal of Solid …, 2021 - iopscience.iop.org
Staggered heterostructure gate stack TFET is proposed. The analog, RF, and linearity
performance of the device were studied in an ATLAS TCAD device simulator. The high K …

Influence of oxide thickness variation on analog and RF performances of SOI FinFET

D Tripathy, DP Acharya, PK Rout… - … Series: Electronics and …, 2022 - casopisi.junis.ni.ac.rs
This paper focuses on the impact of variation in the thickness of the oxide (SiO 2) layer on
the performance parameters of a FinFET analysed by varying the oxide layer thickness in …

Quantum analytical model for lateral dual gate UTBB SOI MOSFET for analog/RF performance

A Basak, A Sarkar - Silicon, 2021 - Springer
This paper presents a quantum analytical modeling of UTBB SOIMOSFET as lateral dual
gate for the first time. In this paper, a 2-dimensional analytical modeling of electric field …

FinFET-Based Inverter Design and Optimization at 7 Nm Technology Node

J Jena, D Jena, E Mohapatra, S Das, TP Dash - Silicon, 2022 - Springer
Stress engineering is one of the best techniques to enhance the potential of a device. In the
first phase of this work, the impact of stress on the physical and electrical performance of …

Study of DC and Analog/RF Performances Analysis of Short Channel Surrounded Gate Junctionless Graded Channel Gate Stack MOSFET

S Misra, SM Biswal, B Baral, SK Pati - Transactions on Electrical and …, 2023 - Springer
In order to pave the path for miniaturization process, surrounded gate junctionless graded
channel gate stack (SJLGCGS) MOSFET is reported in this present work, in the view of …

Design and investigation of a dual material gate arsenic alloy heterostructure junctionless TFET with a lightly doped Source

H **e, H Liu, S Chen, T Han, S Wang - Applied Sciences, 2019 - mdpi.com
This paper designs and investigates a novel structure of dual material gate-engineered
heterostructure junctionless tunnel field-effect transistor (DMGE-HJLTFET) with a lightly …

[HTML][HTML] Impact of back gate work function for enhancement of analog/RF performance of AJDMDG Stack MOSFET

A Basak, A Sarkar - Solid State Electronics Letters, 2020 - Elsevier
In this work, the impact of back gate work function on analog/RF performance of Asymmetric
Junctionless Dual Material Double Gate MOSFET with high K gate Stack (AJDMDG Stack …