SiGeSn quantum well for photonics integrated circuits on Si photonics platform: a review
Recent studies of SiGeSn materials and optoelectronic devices hold great promise for
photonics integrated circuits (PICs) on Si platform featuring scalable, cost-effective, and …
photonics integrated circuits (PICs) on Si platform featuring scalable, cost-effective, and …
[HTML][HTML] All group-IV SiGeSn/GeSn/SiGeSn QW laser on Si operating up to 90 K
In this work, all group-IV band-to-band lasers based on SiGeSn/GeSn/SiGeSn multi-
quantum-well structures were demonstrated. Lasing performance was investigated via two 4 …
quantum-well structures were demonstrated. Lasing performance was investigated via two 4 …
Investigation of optical transitions in a SiGeSn/GeSn/SiGeSn single quantum well structure
A SiGeSn/GeSn/SiGeSn single quantum well structure featuring type-I band alignment was
comprehensively characterized. Three pump lasers with different penetration depths and …
comprehensively characterized. Three pump lasers with different penetration depths and …
Temperature-dependent characteristics of GeSn/Ge multiple-quantum-well photoconductors on silicon
KC Lin, PR Huang, H Li, HH Cheng, GE Chang - Optics Letters, 2021 - opg.optica.org
Temperature-dependent characteristics of GeSn/Ge multiple-quantum-well (MQW)
photoconductors (PCs) on silicon substrate were investigated. The high quality GeSn/Ge …
photoconductors (PCs) on silicon substrate were investigated. The high quality GeSn/Ge …
[HTML][HTML] Direct bandgap type-I GeSn/GeSn quantum well on a GeSn-and Ge-buffered Si substrate
This paper reports the comprehensive characterization of a Ge 0.92 Sn 0.08/Ge 0.86 Sn
0.14/Ge 0.92 Sn 0.08 single quantum well. By using a strain relaxed Ge 0.92 Sn 0.08 buffer …
0.14/Ge 0.92 Sn 0.08 single quantum well. By using a strain relaxed Ge 0.92 Sn 0.08 buffer …
Study of direct bandgap type-I GeSn/GeSn double quantum well with improved carrier confinement
The GeSn-based quantum wells (QWs) have been investigated recently for the development
of efficient GeSn emitters. Although our previous study indicated that the direct bandgap well …
of efficient GeSn emitters. Although our previous study indicated that the direct bandgap well …
Effects of Low-Temperature GeSn Buffer Layers on Sn Surface Segregation During GeSn Epitaxial Growth
T Tsukamoto, N Hirose, A Kasamatsu, T Matsui… - Electronic Materials …, 2020 - Springer
We investigate the effects of the low-temperature (LT) GeSn buffer layers on Sn surface
segregation during the growth of the additional GeSn layers. Sn surface segregation was …
segregation during the growth of the additional GeSn layers. Sn surface segregation was …
High-quality GeSn layer with Sn composition up to 7% grown by low-temperature magnetron sputtering for optoelectronic application
J Yang, H Hu, Y Miao, L Dong, B Wang, W Wang, H Su… - Materials, 2019 - mdpi.com
In this paper, a high-quality sputtered-GeSn layer on Ge (100) with a Sn composition up to
7% was demonstrated. The crystallinity of the GeSn layer was investigated via high …
7% was demonstrated. The crystallinity of the GeSn layer was investigated via high …
Evaluation of crystallinity of lattice-matched Ge/GeSiSn heterostructure by Raman spectroscopy
T Tsukamoto, N Hirose, A Kasamatsu, T Matsui, Y Suda - Thin Solid Films, 2021 - Elsevier
Abstract Lattice-matched Ge/GeSiSn layers were formed on Ge substrates by sputter
epitaxy, and the effects of the thicknesses of the Ge and GeSiSn layers on crystallinity of the …
epitaxy, and the effects of the thicknesses of the Ge and GeSiSn layers on crystallinity of the …
Study of GePb photodetectors for shortwave infrared detection
X Liu, J Zheng, X Li, Z Liu, Y Zuo, C Xue, B Cheng - Optics Express, 2019 - opg.optica.org
Ge_0. 998Pb_0. 002 photodetectors (PDs) with a GePb layer grown on n-type Ge (100)
substrate by magnetron sputtering epitaxy were fabricated by complementary metal-oxide …
substrate by magnetron sputtering epitaxy were fabricated by complementary metal-oxide …