[BOOK][B] Physics of semiconductors

M Grundmann - 2010 - Springer
Semiconductor electronics is commonplace in every household. Semiconductor devices
have enabled economically reasonable fiber-based optical communication, optical storage …

Modified Tauc–Lorentz dispersion model leading to a more accurate representation of absorption features below the bandgap

DV Likhachev, N Malkova, L Poslavsky - Thin Solid Films, 2015 - Elsevier
We reviewed studies reporting the applications of the Tauc–Lorentz (TL) parameterization
for the complex dielectric function in spectroscopic ellipsometry. Since this model became …

Metal‐Insulator‐Insulator‐Metal Diodes with Responsivities Greater Than 30 AW−1 Based on Nitrogen‐Doped TiOx and AlOx Insulator Layers

AH Alshehri, A Shahin, K Mistry… - Advanced Electronic …, 2021 - Wiley Online Library
Metal‐insulator‐insulator‐metal diodes based on nitrogen‐doped titanium dioxide (NTiOx)
and aluminum oxide (NAlOx) are fabricated and characterized for the first time. Pt/TiOx …

Optical spectra and interfacial band offsets of pulse-laser-deposited metal-oxides: SnO2, TiO2, and ZnO

NV Nguyen, N Nguyen, JR Hattrick-Simpers… - Applied Physics …, 2021 - pubs.aip.org
Transparent conducting oxides are electrically conductive materials with high optical
transmittance in the visible region of the spectrum and are useful in a wide range of …

Measurements and model of UV-induced oxidation of aluminum

RF Berg, C Tarrio, TB Lucatorto - … of Vacuum Science & Technology A, 2023 - pubs.aip.org
We present measurements and a model of aluminum oxidation induced by ultraviolet (UV)
radiation. Spots of oxide were grown by focusing synchrotron radiation onto a polycrystalline …

Band offsets and interfacial properties of HfAlO gate dielectric grown on InP by atomic layer deposition

L Yang, T Wang, Y Zou, HL Lu - Nanoscale Research Letters, 2017 - Springer
X-ray photoelectron spectroscopy and high-resolution transmission electron microscopy
have been used to determine interfacial properties of HfO 2 and HfAlO gate dielectrics …

Cu impurity in insulators and in metal-insulator-metal structures: Implications for resistance-switching random access memories

SC Pandey, R Meade, GS Sandhu - Journal of Applied Physics, 2015 - pubs.aip.org
We present numerical results from atomistic simulations of Cu in SiO 2 and Al 2 O 3, with an
emphasis on the thermodynamic, kinetic, and electronic properties. The calculated …

Band offset measurement at the MAPbBr3/Al2O3 heterointerface by X-ray photoelectron spectroscopy

C Gao, X Liu, X Fang, B Li, M Qiu, Q Zhang… - Journal of Alloys and …, 2022 - Elsevier
Recently, Al 2 O 3 has been demonstrated to be an effective material type for perovskite
photoelectric device performance improvement. It is therefore essential to investigate the …

High-speed steep-slope GaInAs impact ionization MOSFETs (I-MOS) with SS= 1.25 mV/dec—Part I: Material and device characterization, DC performance, and …

D Han, G Bonomo, DC Ruiz… - … on Electron Devices, 2022 - ieeexplore.ieee.org
Digital electronics power consumption evolved into a major concern: at the current pace,
general-purpose computing energy consumption will exceed global energy production …

[PDF][PDF] A new method of calculating charged deep level defects density in doped semiconductors from the band offsets of MIS device interfaces

RK Chanana - IOSR-JAP, 2016 - researchgate.net
Band offsets of the semiconductor/Insulator interfaces are utilized to determine charged
deep level defects density in doped single and compound semiconductors. This method is …