Atomic Layer Deposition: An Overview | Chemical Reviews Recently Viewedclose modal ACS
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Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

Platinum-nanoparticle-based catalysts are widely used in many important chemical
processes and automobile industries. Downsizing catalyst nanoparticles to single atoms is …

Plasma-assisted atomic layer deposition (ALD) is an energy-enhanced method for the
synthesis of ultra-thin films with Å-level resolution in which a plasma is employed during one …

Atomic layer deposition (ALD) is a method that allows for the deposition of thin films with
atomic level control of the thickness and an excellent conformality on 3-dimensional …

Atomic layer deposition (ALD) is an attractive method to deposit thin films for advanced
technological applications such as microelectronics and nanotechnology. One material …

Atomic layer deposition (ALD) is a gas-phase deposition technique that, by relying on self-
terminating surface chemistry, enables the control of the amount of deposited material down …

Nanostructured materials made from group 10 (Ni, Pd, Pt) and group 11 (Cu, Ag, Au)
elements have outstanding technological relevance in microelectronics, nano-optics …

Current trends in semiconductor device manufacturing impose extremely stringent
requirements on nanoscale processing techniques, both in terms of accurately controlling …

Atomic layer deposition (ALD), also referred to historically as atomic layer epitaxy, is a vapor-
phase deposition technique for preparing ultra-thin films with precise growth control. ALD is …