SiOx thin films were prepared using magnetron sputtering with different O2 flow rates on a
silicon substrate. The samples were characterized using Fourier transform infrared …

In this work, the effect of plasma on the chemistry and morphology of coatings deposited by
Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition (AP-PECVD) is …

TiO 2 films with high crystallinity and good stoichiometry were prepared by magnetron
sputtering technique under the optimized process conditions and analyzed by various …

TiO 2 films were deposited on monocrystalline silicon wafers with radio frequency (RF)
magnetron sputtering, and the effects of O 2 flow ratio on the films' stoichiometric ratio, phase …

Abstract X-ray diffraction (XRD), grazing incidence X-ray diffraction (GIXRD) and X-ray
reflectometry (XRR) techniques were applied for analysis of titanium (Ti) and titanium (IV) …

Thin films of titanium oxide (TiO 2) are synthesized at room temperature by the post-
discharge of an RF atmospheric plasma torch supplied with argon and oxygen. Vapours of …

Nanocrystalline titanium oxide (TiO 2) thin films were deposited on silicon (1 0 0) and quartz
substrates at various oxygen partial pressures (1× 10− 5 to 3.5× 10− 1 mbar) with a …

Metal–semiconductor–metal ultraviolet (UV) photodetectors (PDs) with Au electrodes, based
on TiO_2 thin films prepared by radio-frequency magnetron sputtering, are fabricated and …

Abstract Nano-crystalline Titanium dioxide (TiO 2) has been well-known as a one of the most
useful semiconductor material for application in self-cleaning coating which contains …

A sol–gel method was applied for fabrication of nanocrystalline anatase TiO 2 thin films on
ITO glass substrates and followed by rapid thermal annealing for application as the work …