Atomic layer deposition (ALD) for high‐quality conformal inorganic thin films is one of the
cornerstones of modern microelectronics, while molecular layer deposition (MLD) is its less …

Contaminant and pollutant have become increasingly prominent environmental issues.
Photocatalysis is a promising way to remove various dyes and organic pollutants in waste …

The atomic/molecular layer deposition (ALD/MLD) technique combining both inorganic and
organic precursors is strongly emerging as a unique tool to design exciting new functional …

Fe 2 O 3, as a substance that exists in nature in large quantities, has been widely paid close
attention by many scholars because of its excellent properties. Fe 2 O 3 can be divided into …

Integrating interfacial molecular nanolayers (MNL) with inorganic nanolayers is of interest for
understanding processing-structure/chemistry correlations in hybrid nanolaminates. Here …

Atomic layer deposition (ALD) technology is one of the cornerstones of the modern
microelectronics industry, where it is exploited in the fabrication of high‐quality inorganic …

Nanoscale hybrid inorganic–organic multilayers are attractive for accessing emergent
phenomena and properties through superposition of nanomolecularly-induced interface …

Atomic layer deposition (ALD) is known as a key enabler of the continuous advances in
device engineering for microelectronics. For instance, the state-of-the-art transistor …

Precisely composition-tuned white-light-emissive lanthanide-organic thin films are fabricated
using the combined atomic/molecular layer deposition (ALD/MLD) technique. The emission …

Advances in interface science over the last 20 years have demonstrated the use of
molecular nanolayers (MNLs) at inorganic interfaces to access emergent phenomena and …