Atomic layer etching (ALE), a cyclic process of surface modification and removal of the
modified layer, is an emerging damage-less etching technology for semiconductor …

The microwave cutoff probe (CP) is an accurate diagnostic technique to measure absolute
electron density even in processing gas plasmas. Because this technique needs the …

It is generally recognized that the electron temperature T e either remains constant or
decreases slightly with plasma power (plasma density). This trend can be simply verified …

Hysteresis, which is the history dependence of physical systems, is one of the most
important topics in physics. Interestingly, bi-stability of plasma with a huge hysteresis loop …

Experimental verification of the discharge mode transition and the hysteresis by considering
matching circuit is investigated in inductively coupled plasma using measurements of the …

The aim of the present paper is to examine the influence of assumption on the electron
energy distribution function on the relation between the plasma potential and the electron …

Spatially resolved measurements of electron energy distribution functions (EEDFs) are
investigated in inductively coupled plasmas with two planar antenna coils. When the plasma …

The effect of the electron energy distribution function (EEDF) on the behavior of the electron
density (ne) is investigated under various gas pressures of nitrogen (N 2) in inductively …

In this study, plasma density measurements were performed near the plume region of the
remote plasma source (RPS) in Ar/${{\rm {NF}}} _ {3} $ gas mixtures using a microwave …

In the industrial semiconductor plasma processing, plasma density and its spatial
distribution are critical for the understanding of discharge physics and the enhancement of …