Semiconductor infrared plasmonics

T Taliercio, P Biagioni - Nanophotonics, 2019 - degruyter.com
The coupling between light and collective oscillations of free carriers at metallic surfaces
and nanostructures is at the origin of one of the main fields of nanophotonics: plasmonics …

[HTML][HTML] Diffusion of n-type dopants in germanium

A Chroneos, H Bracht - Applied Physics Reviews, 2014 - pubs.aip.org
Germanium is being actively considered by the semiconductor community as a mainstream
material for nanoelectronic applications. Germanium has advantageous materials …

Midinfrared plasmon-enhanced spectroscopy with germanium antennas on silicon substrates

L Baldassarre, E Sakat, J Frigerio, A Samarelli… - Nano …, 2015 - ACS Publications
Midinfrared plasmonic sensing allows the direct targeting of unique vibrational fingerprints of
molecules. While gold has been used almost exclusively so far, recent research has focused …

Tunability of the dielectric function of heavily doped germanium thin films for mid-infrared plasmonics

J Frigerio, A Ballabio, G Isella, E Sakat, G Pellegrini… - Physical Review B, 2016 - APS
Heavily doped semiconductor thin films are very promising for application in mid-infrared
plasmonic devices because the real part of their dielectric function is negative and broadly …

[HTML][HTML] Reducing specific contact resistivity for n-type germanium using laser activation process and nano-island formation

S Baik, H Jeong, G Park, H Kang, JE Jang… - Applied Surface …, 2023 - Elsevier
This study presents a laser activation process (LAP) for germanium (Ge) to improve the
electrical performance of n-type Ge devices. The LAP highly activated the dopant and …

[LIVRE][B] Silicon, germanium, and their alloys: growth, defects, impurities, and nanocrystals

G Kissinger, S Pizzini - 2014 - books.google.com
Despite the vast knowledge accumulated on silicon, germanium, and their alloys, these
materials still demand research, eminently in view of the improvement of knowledge on …

Antimony segregation in Ge and formation of n-type selectively doped Ge films in molecular beam epitaxy

DV Yurasov, AV Antonov, MN Drozdov… - Journal of Applied …, 2015 - pubs.aip.org
Antimony segregation in Ge (001) films grown by molecular beam epitaxy was studied. A
quantitative dependence of the Sb segregation ratio in Ge on growth temperature was …

Arsenic Diffusion in MOVPE‐Grown GaAs/Ge Epitaxial Structures

V Orejuela, E García‐Tabares… - Advanced Electronic …, 2024 - Wiley Online Library
Germanium is reemerging as a prominent material in the semiconductor field, particularly for
electronic applications, photonics, photovoltaics, and thermophotovoltaics. Its combination …

Effects of phosphorous and antimony do** on thin Ge layers grown on Si

X Yu, H Jia, J Yang, MG Masteghin, H Beere… - Scientific Reports, 2024 - nature.com
Suppression of threading dislocations (TDs) in thin germanium (Ge) layers grown on silicon
(Si) substrates has been critical for realizing high-performance Si-based optoelectronic and …

The impact of donors on recombination mechanisms in heavily doped Ge/Si layers

MR Barget, M Virgilio, G Capellini… - Journal of Applied …, 2017 - pubs.aip.org
Heavy n-type do** has been proposed as a route to achieve positive optical gain in
germanium layers since it is supposed to enhance the Γ c carrier density. Nevertheless, the …