A novel stable zinc–oxo cluster for advanced lithography patterning
Y Si, Y Zhao, G Shi, D Zhou, F Luo, P Chen… - Journal of Materials …, 2023 - pubs.rsc.org
Recently, the development of novel metal-containing resists has received much attention in
extreme ultraviolet lithography (EUVL) owing to their smaller sizes and higher EUV …
extreme ultraviolet lithography (EUVL) owing to their smaller sizes and higher EUV …
Synthesis of pentameric chlorotin carboxylate clusters for high resolution EUV photoresists under small doses
CD Li, TA Lin, PH Chen, TS Gau, BJ Lin… - Nanoscale …, 2024 - pubs.rsc.org
This work reports the synthesis and characterization of a novel pentameric tin chloro
cluster,(vinylSn) 3Sn2Cl5O2 (OH) 2 (t-BuCO2) 6 (1), and explores its application as an …
cluster,(vinylSn) 3Sn2Cl5O2 (OH) 2 (t-BuCO2) 6 (1), and explores its application as an …
Ultrasensitive metal-organic cluster resist for patterning of single exposure high numerical aperture extreme ultraviolet lithography applications
M Chauhan, K Palit, S Choudhary… - Journal of Micro …, 2022 - spiedigitallibrary.org
Background An incredible increase in the integration of electronic chips has pushed the
semicon industries to endorse high numerical aperture (h-NA∼ 0.5), extreme-ultraviolet …
semicon industries to endorse high numerical aperture (h-NA∼ 0.5), extreme-ultraviolet …
Performance and mechanism of novel antimony oxo cluster photoresist
Y SI, L ZHENG, P CHEN, J FAN, X PENG - CIESC Journal, 2024 - hgxb.cip.com.cn
With the increasing integration of semiconductor industry, higher requirements are put
forward for lithographic materials. In recent years, metal-oxygen oxo clusters (MOCs) …
forward for lithographic materials. In recent years, metal-oxygen oxo clusters (MOCs) …