Plasma-polymer interactions: A review of progress in understanding polymer resist mask durability during plasma etching for nanoscale fabrication
Photolithographic patterning of organic materials and plasma-based transfer of photoresist
patterns into other materials have been remarkably successful in enabling the production of …
patterns into other materials have been remarkably successful in enabling the production of …
Solution-processed chalcogenide glass for integrated single-mode mid-infrared waveguides
Chalcogenide glass materials exhibit a variety of optical properties that make them desirable
for near-and mid-infrared communications and sensing applications. However, processing …
for near-and mid-infrared communications and sensing applications. However, processing …
Are slot and sub-wavelength grating waveguides better than strip waveguides for sensing?
The unique ability of slot and sub-wavelength grating (SWG) waveguides to confine light
outside of the waveguide core material has attracted significant interest in their application to …
outside of the waveguide core material has attracted significant interest in their application to …
[КНИГА][B] Microlithography: science and technology
BW Smith, K Suzuki - 2018 - taylorfrancis.com
This new edition of the bestselling Microlithography: Science and Technology provides a
balanced treatment of theoretical and operational considerations, from elementary concepts …
balanced treatment of theoretical and operational considerations, from elementary concepts …
Deep learning denoising of SEM images towards noise-reduced LER measurements
As chip sizes decrease and node dimensions break the sub-10 nm barrier, Line Edge
Roughness (LER) metrology becomes a critical issue for the semiconductor research and …
Roughness (LER) metrology becomes a critical issue for the semiconductor research and …
Line edge roughness and critical dimension variation: Fractal characterization and comparison using model functions
Line edge (or width) roughness (LER or LWR) of photoresists lines constitutes a serious
issue in shrinking the critical dimensions (CD) of the gates to dimensions of a few tens of …
issue in shrinking the critical dimensions (CD) of the gates to dimensions of a few tens of …
Controlled Stepwise Wet Etching of Polycrystalline Mo Nanowires
With the persistent downscaling of integrated circuits, molybdenum (Mo) is currently
considered a potential replacement for copper (Cu) as a material for metal interconnects …
considered a potential replacement for copper (Cu) as a material for metal interconnects …
A review of line edge roughness and surface nanotexture resulting from patterning processes
The importance of surface and sidewall roughness in nanotechnology is discussed and a
roughness study framework is presented. The framework is based on the interaction triangle …
roughness study framework is presented. The framework is based on the interaction triangle …
Pattern transfer using poly (styrene-block-methyl methacrylate) copolymer films and reactive ion etching
Self-assembly block copolymers have drawn a lot of attention for its great potential on critical
dimension (CD) control and line-edge roughness (LER) reduction, which become more and …
dimension (CD) control and line-edge roughness (LER) reduction, which become more and …
Canny Algorithm Enabling Precise Offline Line Edge Roughness Acquisition in High-Resolution Lithography
Z Hu, R Zhao, X Wang, P Tao, Q Wang, Y Wang… - ACS …, 2023 - ACS Publications
The line edge roughness (LER) is one of the most critical indicators of photoresist imaging
performance, and its measurement using a reliable method is of great significance for …
performance, and its measurement using a reliable method is of great significance for …