With the down-scaling of CMOS technology, the design complexity of very large-scale
integrated is increasing. Although the application of machine learning (ML) techniques in …

Due to the increasing size of integrated circuits (ICs), their design and optimization phases
(ie, computer-aided design, CAD) grow increasingly complex. At design time, a large design …

Lithographic hotspot detection is crucial for ensuring manufacturability and yield in
advanced integrated circuit (IC) designs. While machine learning approaches have shown …

To speed up the FPGA placement and routing closure, we propose a novel approach to
predict the routing congestion map for large-scale FPGA designs at the placement stage …

Due to sensitive layout-dependent effects and varied performance metrics, analog routing
automation for performance-driven layout synthesis is difficult to generalize. Existing …

Continuous scaling of the VLSI system leaves a great challenge on manufacturing, thus
optical proximity correction (OPC) is widely applied in conventional design flow for …

Computational lithography provides algorithmic and mathematical support for resolution
enhancement in optical lithography, which is the critical step in semiconductor …

As one of the key techniques for resolution enhancement technologies (RETs), optical
proximity correction (OPC) suffers from prohibitive computational costs as feature sizes …

Lithography simulation is a critical step in VLSI design and optimization for
manufacturability. Existing solutions for highly accurate lithography simulation with rigorous …

The breakdown performance is a critical metric for power device design. This paper explores
the feasibility of efficiently predicting the breakdown performance of silicon on insulator (SOI) …