This is a topical review on advanced lithographic methods used to create 3D topographies.
We start the discussion with the principal capabilities of grayscale electron beam lithography …

Abstract Electron Beam Lithography (EBL) is a fundamental technique of nanofabrication,
allowing not only the direct writing of structures down to sub-10 nm dimensions, but also …

A modern alternative to the positive-tone PMMA resist is the ZEP 520A (Nippon Zeon) brand
co-polymer resist, which offers a higher sensitivity and etch durability for electron beam …

Transmission electron microscopy (TEM) has been used in the characterizations of the
lattice and defect structures as well as electronic and chemical properties of various …

ZEP brand electron beam resists are well-known for their high sensitivity and etch durability.
The various performance metrics such as sensitivity, contrast, and resolution of ZEP resist …

Electron-beam lithography (EBL) is an important technique in manufacturing high-resolution
nanopatterns for broad applications. However, the proximity effect in EBL can degrade the …

Plasmonic metasurface nanostructures have the potential to enable nonlinear optical
functionality in metasurfaces by reducing power operating thresholds and enabling ultra-thin …

The interaction of bacteria on nanopatterned surfaces has caught attention since the
discovery of the bactericidal property of cicada wing surfaces. While many studies focused …

Abstract A three-dimensional (3-D) remaining resist profile often needs to be estimated and
examined especially for nanoscale feature. However, conventional methods, such as the …

For acquiring high-contrast and high-brightness images in hard-x-ray optics, Fresnel zone
plates with high aspect ratios (zone height/zone width) have been constantly pursued …