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Effect of Al precursor's properties on interactions with self-assembled monolayers for area selective deposition
E Gu, J Yan, B Li, H Zhou, Z Lu, Y Wen… - Journal of Vacuum …, 2024 - pubs.aip.org
Area selective deposition (ASD) is a high-precision atomic-level manufacturing technology
that enables the development of bottom-up manufacturing methods in the future …
that enables the development of bottom-up manufacturing methods in the future …
Computational ab initio approaches for area-selective atomic layer deposition: methods, status and perspectives
F Pieck, R Tonner-Zech - 2024 - chemrxiv.org
Area-selective atomic layer deposition (AS-ALD) has emerged as a transformative technique
in nanotechnology, enabling the precise deposition of materials on designated substrates …
in nanotechnology, enabling the precise deposition of materials on designated substrates …