In the continuously evolving realm of nonlinear optics, epsilon near zero (ENZ) materials
have captured significant scientific interest, becoming a compelling focal point over the past …

We present a comparative study of the optical properties of 50 nm-thick titanium nitride (TiN)
films deposited on a silicon substrate by pulsed-DC sputtering, thermal, and plasma …

The distinctive layered crystal structures and diverse properties of 2D layered materials
(2DLMs) have established them as prospective building blocks for implementing next …

Titanium nitride is a well-known conductive ceramic material that has recently experienced
resumed attention because of its plasmonic properties comparable to metallic gold and …

A current approach to depositing highly plasmonic titanium nitride films using the magnetron
sputtering technique assumes that the process is performed at temperatures high enough to …

Dynamic and independent amplitude and phase manipulation are the paramount demand
for many advanced wavefronts engineering applications. Currently, the coupling issue …

Titanium nitride (TiN) has emerged as a highly promising alternative to traditional plasmonic
materials. This study focuses on the inclusion of a Cr90Ru10 buffer layer between the …

Femtosecond laser has great potential in controlling the surface structure of titanium nitride
(TiN) to promote plasmonic photothermal effect. Studying the mechanism of femtosecond …

The growth of crystalline Li-based oxide thin films on silicon substrates is essential for the
integration of next-generation solid-state lithionic and electronic devices including on-chip …

Managing the hardness, density, and residual stress of the titanium nitride (TiN) hard mask
has become increasingly significant for achieving excellent selectivity in the high aspect …