Investigation of oxygen penetration during UV nanosecond laser annealing of silicon at high energy densities

R Monflier, T Tabata, H Rizk, J Roul, K Huet… - Applied Surface …, 2021 - Elsevier
In this work, we present a comprehensive investigation of impurities contamination in silicon
during UV Nanosecond Laser Annealing at high energy density. By investigating in detail …