Nanometer interface and materials control for multilayer EUV-optical applications
E Louis, AE Yakshin, T Tsarfati, F Bijkerk - Progress in Surface Science, 2011 - Elsevier
An overview is given of the progress in thin film and surface physics involved in multilayered
systems with nanometer scale periodicity. When properly engineered, these enable the …
systems with nanometer scale periodicity. When properly engineered, these enable the …
Improved reflectance and stability of Mo-Si multilayers
S Bajt, JB Alameda, TW Barbee Jr, WM Clift… - Optical …, 2002 - spiedigitallibrary.org
Commercial EUV lithographic systems require multilayers with higher reflectance and better
stability than those published to date. This work represents our effort to meet these …
stability than those published to date. This work represents our effort to meet these …
Localized defects in multilayer coatings
DG Stearns, PB Mirkarimi, E Spiller - Thin Solid Films, 2004 - Elsevier
We present a non-linear continuum model of the growth of localized defects in multilayer
coatings nucleated by particles on the substrate. The model is valid when the deposition and …
coatings nucleated by particles on the substrate. The model is valid when the deposition and …
High-performance Mo-Si multilayer coatings for extreme-ultraviolet lithography by ion-beam deposition
E Spiller, SL Baker, PB Mirkarimi, V Sperry… - Applied …, 2003 - opg.optica.org
An ion-beam deposition system has been used to fabricate Mo-Si multilayer coatings for
masks and imaging optics to be used for extreme-ultraviolet lithography. In addition to high …
masks and imaging optics to be used for extreme-ultraviolet lithography. In addition to high …
System integration and performance of the EUV engineering test stand
DA Tichenor, AK Ray-Chaudhuri… - Emerging …, 2001 - spiedigitallibrary.org
The Engineering Test Stand (ETS) is a developmental lithography tool designed to
demonstrate full-field EUV imaging and provide data for commercial-tool development. In …
demonstrate full-field EUV imaging and provide data for commercial-tool development. In …
Development and testing of EUV multilayer coatings for the atmospheric imaging assembly instrument aboard the Solar Dynamics Observatory
We present experimental results on the development and testing of the extreme ultraviolet
(EUV) reflective multilayer coatings that will be used in the Atmospheric Imaging Assembly …
(EUV) reflective multilayer coatings that will be used in the Atmospheric Imaging Assembly …
Sub-diffraction-limited multilayer coatings for the 0.3 numerical aperture micro-exposure tool for extreme ultraviolet lithography
Multilayer coating results are discussed for the primary and secondary mirrors of the micro-
exposure tool (MET): a 0.30 NA lithographic imaging system with a 200 μm× 600 μm field of …
exposure tool (MET): a 0.30 NA lithographic imaging system with a 200 μm× 600 μm field of …
Design and fabrication of broadband EUV multilayer mirrors
T Kuhlmann, SA Yulin, T Feigl, N Kaiser… - Emerging …, 2002 - spiedigitallibrary.org
Multilayer mirrors with a significantly increased bandwidth in spectral and angular
reflectance have been designed and deposited with a commercial magnetron sputtering …
reflectance have been designed and deposited with a commercial magnetron sputtering …
Multilayer X-ray optics
AV Vinogradov - Quantum electronics, 2002 - iopscience.iop.org
q308tretyakov 941..944 Page 1 Quantum Electronics SPECIAL ISSUE DEVOTED TO THE
80TH ANNIVERSARY OF ACADEMICIAN NG BASOV'S BIRTH Multilayer X-ray optics To cite …
80TH ANNIVERSARY OF ACADEMICIAN NG BASOV'S BIRTH Multilayer X-ray optics To cite …
Multilayer coatings for EUV/soft x-ray mirrors
S Yulin - Optical interference coatings, 2003 - Springer
The demand to enhance optical resolution has pushed the search for technological
innovations and improvements. Induced mainly by this aim, optics development in recent …
innovations and improvements. Induced mainly by this aim, optics development in recent …